Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.59 |
| ▸ | LTA4H | P09960 | 1/20 | 0.50 |
| ▸ | VHL | P40337 | 1/20 | 0.40 |
| ▸ | ELOC | Q15369 | 1/20 | 0.40 |
| ▸ | ELOB | Q15370 | 1/20 | 0.40 |
| ▸ | KIF11 | P52732 | 3/20 | 0.38 |
| ▸ | NOS3 | P29474 | 1/20 | 0.38 |
| ▸ | NOS1 | P29475 | 1/20 | 0.38 |
| ▸ | TTR | P02766 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | PPARG | P37231 | 2/20 | 0.37 |
| ▸ | PPARA | Q07869 | 2/20 | 0.37 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.37 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.37 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3190141 | 1.00 | TSHR (0.59) | TSHRLTA4HVHLELOCELOB | |
| Hydrochloric Acid SCHEMBL31448262 | 0.98 | TSHR (0.56) | TSHRLTA4HVHLELOCELOB | |
| SCHEMBL3188718 | 0.90 | TSHR (0.48) | TSHRLTA4HVHLELOCELOB | |
| SCHEMBL13102527 | 0.82 | TDP1 (0.62) | TSHRLTA4HTDP1PPARACA12 | |
| SCHEMBL13337729 | 0.81 | CA2 (0.46) | TSHRLTA4HNOS3NOS1TDP1 | |
| SCHEMBL9608259 | 0.80 | CALM1 (0.55) | TSHRLTA4HTDP1CA12CA1 | |
| SCHEMBL11941640 | 0.79 | IDO1 (0.41) | TSHRNOS3NOS1TTRPRSS1 | |
| SCHEMBL12575698 | 0.79 | IDO1 (0.41) | TSHRLTA4HVHLELOCELOB | |
| Benzyl Alcohol SCHEMBL31038373 | 0.79 | — | — | |
| SCHEMBL12762137 | 0.79 | ALDH1A1 (0.38) | TSHRLTA4HTDP1CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9926422-B2 | Bump-forming material, method for producing electronic component, method for producing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9904167-B2 | Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| EP-2891014-B1 | PATTERN FORMING METHOD, AND ELECTRONIC DEVICE PRODUCING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2017-11-29 | — | — | EP | disclosed |
| US-20170260348-A1 | BUMP-FORMING MATERIAL, METHOD FOR PRODUCING ELECTRONIC COMPONENT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2017-09-14 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9551928-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9500951-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9459531-B2 | — | — | 2016-10-04 | — | — | US | disclosed |
| US-20100183979-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100136479-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20100009288-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20090269695-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090233198-A1 | PHOTOCURABLE COMPOSITION, OVERPRINT, AND PRODUCTION PROCESS THEREFOR | FUJIFILM CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090220890-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | TSHR 2626/4885LTA4H 2800/4885VHL 2864/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | TSHR 3426/4885LTA4H 1470/4885VHL 3099/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | TSHR 1202/4885LTA4H 4272/4885VHL 3258/4885 |
| US-20100136479-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | AFF1, F12, AFF2 | TSHR 2706/4885LTA4H 2022/4885VHL 1085/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.