SCHEMBL27416474

SCHEMBL27416474

CS(c1ccccc1)(c1ccccc1)c1ccc(SC(F)(F)F)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.45
KDM4E B2RXH2 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
PTPRZ1 P23471 4/20 0.45
PTPN1 P18031 2/20 0.45
LMNA P02545 4/20 0.41
KCNK2 O95069 1/20 0.39
KCNK10 P57789 1/20 0.39
MAPT P10636 2/20 0.38
ATM Q13315 1/20 0.38
HSD11B1 P28845 1/20 0.38
HTT P42858 2/20 0.37
TSHR P16473 1/20 0.37
MAPK1 P28482 1/20 0.37
OXTR P30559 1/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
GAA P10253 1/20 0.33
KIF11 P52732 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27344449 0.81 ALDH1A1 (0.45) ALDH1A1KDM4ETDP1PTPRZ1PTPN1
SCHEMBL10987264 0.81 HTR6 (0.54) ALDH1A1KDM4ETDP1PTPRZ1PTPN1
SCHEMBL14325967 0.77 ALDH1A1 (0.42) ALDH1A1MAPTHTTTSHRMAPK1
SCHEMBL22175298 0.77 SLC6A4 (0.44) ALDH1A1MAPTHSD11B1TSHRKIF11
SCHEMBL777056 0.76 ALDH1A1 (0.56) ALDH1A1KDM4ETDP1PTPRZ1PTPN1
SCHEMBL14325966 0.75 HPGD (0.45) ALDH1A1MAPTSMN1; SMN2
SCHEMBL28134224 0.74 ALDH1A1 (0.54) ALDH1A1KDM4ETDP1PTPRZ1PTPN1
Fluoride SCHEMBL27372198 0.74 ALDH1A1 (0.54) ALDH1A1KDM4ETDP1PTPRZ1PTPN1
Water SCHEMBL28356277 0.74 ALDH1A1 (0.54) ALDH1A1KDM4ETDP1PTPRZ1PTPN1
SCHEMBL26428857 0.74 ALDH1A1 (0.54) ALDH1A1HSD11B1TSHRKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024128040-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD 富士フイルム株式会社 2024-06-20 WO disclosed