Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 1/20 | 0.48 |
| ▸ | EP300 | Q09472 | 1/20 | 0.47 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.47 |
| ▸ | IMPDH2 | P12268 | 1/20 | 0.44 |
| ▸ | IMPDH1 | P20839 | 1/20 | 0.44 |
| ▸ | NQO1 | P15559 | 1/20 | 0.42 |
| ▸ | CDC25B | P30305 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | PLK1 | P53350 | 1/20 | 0.40 |
| ▸ | HPGDS | O60760 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL4257986 | 0.84 | IDO1 (0.36) | IDO1EP300KAT8IMPDH2IMPDH1 | |
| SCHEMBL12172612 | 0.84 | NQO1 (0.43) | IDO1EP300KAT8NQO1MAPT | |
| SCHEMBL419307 | 0.77 | IDO1 (0.73) | IDO1EP300KAT8IMPDH2IMPDH1 | |
| SCHEMBL29380721 | 0.77 | IDO1 (0.73) | IDO1EP300KAT8IMPDH2IMPDH1 | |
| SCHEMBL31005134 | 0.76 | CA1 (0.50) | MAPTCA12CA1CA2CA4 | |
| SCHEMBL2090403 | 0.76 | CA1 (0.50) | MAPTCA12CA1CA2CA4 | |
| SCHEMBL3203135 | 0.73 | CA12 (0.48) | NQO1MAPTCA12CA1CA2 | |
| SCHEMBL3182131 | 0.73 | ACHE (0.48) | NQO1MAPTCYP2C9CA12CA1 | |
| SCHEMBL3203674 | 0.73 | CA12 (0.48) | MAPTCYP2C9CA12CA1CA2 | |
| SCHEMBL12411061 | 0.73 | IDO1 (0.47) | IDO1EP300KAT8IMPDH2IMPDH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9152047-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound | FUJIFILM CORPORATION (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9052590-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9051403-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| US-9005870-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-20140349223-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2014-11-27 | — | — | US | disclosed |
| US-8785917-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-22 | — | — | US | disclosed |
| US-8753798-B2 | Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head | CANON KABUSHIKI KAISHA (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8673546-B2 | Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head | CANON KABUSHIKI KAISHA (JP) | 2014-03-18 | — | — | US | disclosed |
| US-20120082939-A1 | ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110183263-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-7914968-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7858286-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20100304289-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-7736842-B2 | Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20090098483-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHA KOGYO CO., LTD. (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20070269744-A1 | Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100233617-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION | ZYX, CD79B, TERB1 | IDO1 1973/4885EP300 4448/4885KAT8 1554/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.