Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | CES1 | P23141 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27100322 | 0.87 | MEN1 (0.33) | — | |
| SCHEMBL4986813 | 0.84 | HSD17B10 (0.36) | HSD17B10CES1TDP1LMNA | |
| SCHEMBL9634150 | 0.82 | TSHR (0.45) | TSHRALDH1A1 | |
| SCHEMBL284203 | 0.81 | — | — | |
| SCHEMBL25774461 | 0.80 | CES1 (0.36) | CES1 | |
| SCHEMBL14070492 | 0.80 | TSHR (0.33) | TSHRALDH1A1 | |
| SCHEMBL12723187 | 0.79 | HSD17B10 (0.33) | HSD17B10CES1TSHR | |
| SCHEMBL18961181 | 0.79 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL284658 | 0.78 | — | — | |
| SCHEMBL283952 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8637220-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20090274975-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |