Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | INMT | O95050 | 4/20 | 0.91 |
| ▸ | USP2 | O75604 | 2/20 | 0.91 |
| ▸ | NOS3 | P29474 | 5/20 | 0.41 |
| ▸ | NOS1 | P29475 | 5/20 | 0.41 |
| ▸ | NOS2 | P35228 | 5/20 | 0.41 |
| ▸ | ACHE | P22303 | 5/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL496207 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL219036 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL6859113 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL5475300 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL2956216 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL3270217 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL2956214 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL6038391 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL20718625 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 | |
| SCHEMBL2952223 | 1.00 | INMT (0.91) | INMTUSP2NOS3NOS1NOS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2785726-B1 | ESTER-FUNCTIONAL SILANES AND THE PREPARATION AND USE THEREOF; AND USE OF IMINIUM COMPOUNDS AS PHASE TRANSFER CATALYSTS | DOW SILICONES CORP (US) | 2018-08-01 | — | — | EP | disclosed |
| EP-2573092-B1 | Method for the preparation and use of bis (alkoxysilylorgano)-dicarboxylates | DOW CORNING (US) | 2017-03-29 | — | — | EP | disclosed |
| US-9518072-B2 | Ester-functional silanes and the preparation and use thereof; and use of iminium compounds as phase transfer catalysts | DOW CORNING CORPORATION (US) | 2016-12-13 | — | — | US | disclosed |
| US-9500951-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9459531-B2 | — | — | 2016-10-04 | — | — | US | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-9188862-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9188865-B2 | Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150284492-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20120003590-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20120003583-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-6794530-B1 | 1,4-ADDITION OF MONOHYDRIC OR POLYHYDRIC ALCOHOLS TO ALPHA , BETA -UNSATURATED NITRILES | BASF AKTIENGESELLSCHAFT (DE) | 2004-09-21 | — | — | US | disclosed |
| EP-0999206-B1 | Process for producing alpha cyano acetic acid esters | BASF AG (DE) | 2002-09-18 | — | — | EP | disclosed |
| US-6166207-A | Preparation of bicyclic amidines and diazacycloalkenes | BASF AKTIENGESELLSCHAFT (DE) | 2000-12-26 | — | — | US | disclosed |
| US-6130347-A | REACTING MONOCHLOROACETIC ESTER WITH HYDROGEN CYANIDE IN BASE PRESENCE; CYANATION | BASF AKTIENGESELLSCHAFT (DE) | 2000-10-10 | — | — | US | disclosed |
| EP-0999206-A1 | Process for producing alpha cyano acetic acid esters | BASF AKTIENGESELLSCHAFT (DE) | 2000-05-10 | — | — | EP | disclosed |
| US-4943633-A | Catalytic preparation of cyanoalkyl lactams | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1990-07-24 | — | — | US | disclosed |
| EP-0080171-B1 | HEAT-INSULATING MOULDING AND PROCESS FOR PREPARING THE SAME | Hitachi, Ltd. (JP) | 1988-06-08 | — | — | EP | disclosed |