⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2011391 | 0.79 | — | — | |
| SCHEMBL1293040 | 0.79 | TSHR (0.40) | — | |
| SCHEMBL866028 | 0.79 | — | — | |
| SCHEMBL4094094 | 0.77 | — | — | |
| SCHEMBL2930252 | 0.77 | — | — | |
| SCHEMBL2009132 | 0.76 | TSHR (0.57) | — | |
| SCHEMBL2779389 | 0.76 | — | — | |
| SCHEMBL27854078 | 0.76 | TSHR (0.45) | — | |
| SCHEMBL28549177 | 0.74 | TSHR (0.44) | — | |
| SCHEMBL11340311 | 0.74 | TSHR (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1114681-A | Hair and skin washing and treatment compositions based on ceramide and on polymers containing cationic groups | OREAL (FR) | 1996-01-10 | — | — | CN | claimed |
| CN-1696235-B | Barrier polishing solution | CMP ROHM AND HAAS ELECTRONIC MATERIAL HOLDINGS INC | 2014-04-09 | — | — | CN | disclosed |
| CN-1609156-B | Composition for polishing semiconductor layers | ROHM & HAAS ELECT MAT | 2012-03-28 | — | — | CN | disclosed |
| CN-100462415-C | High-rate barrier polishing composition | CMP ROHM AND HAAS ELECTRONIC M (US) | 2009-02-18 | — | — | CN | disclosed |
| CN-1696235-A | Barrier polishing solution | CMP ROHM AND HAAS ELECTRONIC M (US) | 2005-11-16 | — | — | CN | disclosed |
| CN-1616574-A | High-rate barrier polishing composition | CMP ROHM AND HAAS ELECTRONIC M (US) | 2005-05-18 | — | — | CN | disclosed |
| CN-1609156-A | Composition for polishing semiconductor layers | ROHM & HAAS ELECT MAT (US) | 2005-04-27 | — | — | CN | disclosed |
| CN-1492902-A | Novel polymer binder system with ionic liquids | ����ά˹���������¹ɷ�����˾ | 2004-04-28 | — | — | CN | disclosed |