SCHEMBL27427596

SCHEMBL27427596

CCOCCO[SH](=O)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27854261 0.76 CA2 (0.38)
SCHEMBL19970453 0.74 ALDH1A1 (0.60)
SCHEMBL22247 0.74
SCHEMBL27479320 0.74
SCHEMBL13964789 0.74 MEN1 (0.54)
SCHEMBL28842088 0.74 MEN1 (0.54)
Ammonia Solution, Strong SCHEMBL27478904 0.72
SCHEMBL28574571 0.72 ALDH1A1 (0.34)
SCHEMBL987828 0.71 ALDH1A1 (0.56)
SCHEMBL9639226 0.71 ALDH1A1 (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116568743-A Cleaning composition 富士胶片电子材料美国有限公司 2023-08-08 CN disclosed
CN-111902379-B Cleaning composition 富士胶片电子材料美国有限公司 2023-02-17 CN disclosed
CN-110475845-B Cleaning composition for removing residue on semiconductor substrate 富士胶片电子材料美国有限公司 2022-02-25 CN disclosed
CN-111902379-A Cleaning composition 富士胶片电子材料美国有限公司 2020-11-06 CN disclosed
CN-110537146-A Photosensitive resin composition NISSAN CHEMICAL CORP 2019-12-03 CN disclosed
CN-110475845-A For removing the cleaning compositions of the residue on semiconductor substrate FUJIFILM ELECTRONIC MAT USA INC 2019-11-19 CN disclosed
CN-110461887-A Cured film is formed with composition, orientation material and phase difference material NISSAN CHEMICAL CORP 2019-11-15 CN disclosed
CN-110461964-A Cured film is formed with composition, orientation material and phase difference material NISSAN CHEMICAL CORP 2019-11-15 CN disclosed
CN-110461965-A Cured film is formed with composition, orientation material and phase difference material NISSAN CHEMICAL CORP 2019-11-15 CN disclosed
CN-110408159-A Cured film, which is formed, uses composition, oriented material and phase difference material NISSAN CHEMICAL IND LTD 2019-11-05 CN disclosed
CN-104379666-A Composition for forming cured film, alignment material, and phase difference material NISSAN CHEMICAL IND LTD 2015-02-25 CN disclosed
CN-102834453-B Thermosetting film forming composition having photo-alignment property NISSAN CHEMICAL IND LTD 2015-01-28 CN disclosed
CN-103842447-A Cured film-forming composition, alignment material, and phase difference material NISSAN CHEMICAL IND LTD 2014-06-04 CN disclosed
CN-103068928-A Resin composition, liquid crystal alignment material, and phase difference material NISSAN CHEMICAL IND LTD 2013-04-24 CN disclosed
CN-103052680-A Resin composition, liquid crystal orientation agent, and phase difference agent NISSAN CHEMICAL IND LTD 2013-04-17 CN disclosed
CN-102834455-A Thermosetting film forming composition having photo-alignment property NISSAN CHEMICAL IND LTD 2012-12-19 CN disclosed
CN-102834453-A Thermosetting film forming composition having photo-alignment property NISSAN CHEMICAL IND LTD 2012-12-19 CN disclosed
CN-102471629-A Composition for forming thermoset film having photo-alignment properties NISSAN CHEMICAL IND LTD 2012-05-23 CN disclosed
CN-102460288-A Composition for forming thermoset film having photo-alignment properties NISSAN CHEMICAL IND LTD 2012-05-16 CN disclosed
CN-1107646-A Material for generating electric energy DAIKIN IND LTD (JP) 1995-08-30 CN disclosed