SCHEMBL27428623

SCHEMBL27428623

C=CC(=O)OC(C)(OC(=O)c1ccccc1C(=O)O)C(C)O

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.38
ALOX15 P16050 1/20 0.37
KMT2A Q03164 3/20 0.36
LMNA P02545 2/20 0.36
TSHR P16473 1/20 0.35
CYP3A4 P08684 1/20 0.35
KDM4E B2RXH2 5/20 0.35
HSD17B10 Q99714 5/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C9 P11712 1/20 0.35
HPGD P15428 3/20 0.34
MAPT P10636 1/20 0.34
MEN1 O00255 1/20 0.34
USP2 O75604 1/20 0.33
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28063877 0.92 ALDH1A1 (0.39) ALDH1A1ALOX15KMT2ALMNATSHR
SCHEMBL7196758 0.82 ALDH1A1 (0.42) ALDH1A1ALOX15KMT2ALMNATSHR
SCHEMBL27494240 0.81 ALDH1A1 (0.41) ALDH1A1ALOX15KMT2ALMNATSHR
SCHEMBL27456463 0.81 ALDH1A1 (0.38) ALDH1A1ALOX15KMT2ALMNATSHR
SCHEMBL2817147 0.79 THRB (0.42) ALDH1A1KMT2ATSHRCYP3A4MAPT
SCHEMBL29058304 0.79 ALDH1A1 (0.45) ALDH1A1ALOX15KMT2ACYP3A4KDM4E
SCHEMBL10209980 0.78 ALDH1A1 (0.41) ALDH1A1ALOX15KMT2ALMNATSHR
SCHEMBL27281544 0.78 TSHR (0.42) ALDH1A1TSHRCYP3A4HSD17B10HPGD
SCHEMBL14974984 0.77 ALDH1A1 (0.44) ALDH1A1ALOX15KMT2ALMNATSHR
SCHEMBL867866 0.75 ALDH1A1 (0.48) ALDH1A1ALOX15KMT2ALMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1111758-C Photosensitive resin composition and photosensitive element using resin composition NICHIGO MORTON CO LTD (JP) 2003-06-18 CN disclosed
CN-1221129-A Photosensitive resin composition and photosensitive element using resin composition NICHIGO MORTON CO LTD (JP) 1999-06-30 CN disclosed