Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | CCR2 | P41597 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | GRIA2 | P42262 | 1/20 | 0.31 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.31 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27433340 | 0.86 | NPSR1 (0.34) | RAB9ACCR2MTNR1AKMT2AALDH1A1 | |
| SCHEMBL27433338 | 0.76 | — | — | |
| SCHEMBL27433336 | 0.76 | — | — | |
| SCHEMBL27433419 | 0.70 | — | — | |
| SCHEMBL13500570 | 0.62 | KDM4E (0.38) | KDM4ELMNARAB9ACYP1A2CYP2C9 | |
| SCHEMBL14219143 | 0.60 | POLB (0.36) | KDM4ELMNARAB9AMTNR1AMTNR1B | |
| SCHEMBL27433421 | 0.60 | — | — | |
| SCHEMBL23052290 | 0.59 | LMNA (0.46) | LMNAMTNR1AMTNR1BMEN1KMT2A | |
| SCHEMBL20632696 | 0.58 | HDAC1 (0.49) | KDM4EMEN1KMT2AALDH1A1ALOX15 | |
| SCHEMBL27433423 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024135498-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2024-06-27 | — | — | WO | disclosed |