⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL274353 | 0.94 | — | — | |
| SCHEMBL14346751 | 0.89 | — | — | |
| SCHEMBL9842019 | 0.89 | — | — | |
| SCHEMBL16724746 | 0.88 | — | — | |
| SCHEMBL3037560 | 0.84 | — | — | |
| SCHEMBL2960816 | 0.84 | — | — | |
| SCHEMBL4862588 | 0.80 | — | — | |
| SCHEMBL211737 | 0.80 | — | — | |
| SCHEMBL7743256 | 0.80 | — | — | |
| SCHEMBL34977 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3966218-B1 | PREPARATION OF SILOXANES IN THE PRESENCE OF CATIONIC GERMANIUM (II) COMPOUNDS | WACKER CHEMIE AG (DE) | 2023-07-26 | — | — | EP | disclosed |
| US-20220315611-A1 | PREPARATION OF SILOXANES IN THE PRESENCE OF CATIONIC GERMANIUM(II) COMPOUNDS | WACKER CHEMIE AG (DE) | 2022-10-06 | — | — | US | disclosed |
| CN-114026103-A | Preparation of siloxanes in the presence of cationic germanium (II) compounds | 瓦克化学股份公司 | 2022-02-08 | — | — | CN | disclosed |
| EP-1607081-B1 | COSMETIC PREPARATION | KAO CORP (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-8003169-B2 | Using photoinitiators; discharging plasma ; applying to three-dimensional substrate | BASF SE (DE) | 2011-08-23 | — | — | US | disclosed |
| US-20100087395-A1 | COSMETIC PREPARATION | KAO CORPORATION (JP) | 2010-04-08 | — | — | US | disclosed |
| US-7435461-B2 | Hydrolysis-condensation product of a hydrolyzable and polycondensable reactive metal compound; improved display unevenness; liquid crystal display | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20080075981-A1 | Magnetic recording medium | HITACHI MAXELL, LTD. (JP) | 2008-03-27 | — | — | US | disclosed |
| EP-1481979-B1 | Preparation of branched tetrasiloxane | SHINETSU CHEMICAL CO (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-20060222615-A1 | Cosmetic preparation | KANEBO COSMETICS INC. (JP) | 2006-10-05 | — | — | US | disclosed |
| EP-1510520-B1 | Preparation of branched siloxane | SHINETSU CHEMICAL CO (JP) | 2006-07-26 | — | — | EP | disclosed |
| EP-1607081-A1 | COSMETIC PREPARATION | Kanebo Cosmetics, Inc. (JP) | 2005-12-21 | — | — | EP | disclosed |
| US-6943264-B2 | Preparation of branched siloxane | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2005-09-13 | — | — | US | disclosed |
| US-20050186360-A1 | Cellulose acylate film | FUJI FILM PHOTO CO., LTD. (JP) | 2005-08-25 | — | — | US | disclosed |
| US-6875881-B2 | Preparation of branched tetrasiloxane | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-05 | — | — | US | disclosed |
| US-20050049427-A1 | Preparation of branched siloxane | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-03 | — | — | US | disclosed |
| EP-1510520-A1 | Preparation of branched siloxane | Shin-Etsu Chemical Co., Ltd. (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-20040242912-A1 | Reactin disiloxane with alcohol in presence of acid catalyst | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-02 | — | — | US | disclosed |
| EP-1481979-A1 | Preparation of branched tetrasiloxane | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |