SCHEMBL27436520

SCHEMBL27436520

CCC(C)(CO)C(=O)OC1(c2ccccc2)CCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 4/20 0.39
▸ OPRD1 P41143 3/20 0.39
▸ OPRK1 P41145 3/20 0.39
▸ DRD3 P35462 2/20 0.38
▸ APOBEC3A P31941 2/20 0.38
▸ APOBEC3G Q9HC16 2/20 0.38
▸ ADORA3 P0DMS8 1/20 0.38
▸ AKR1C1 Q04828 1/20 0.37
▸ PRCP P42785 2/20 0.37
▸ SIGMAR1 Q99720 2/20 0.37
▸ ALDH1A1 P00352 3/20 0.36
▸ POLB P06746 1/20 0.36
▸ HTT P42858 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ CYP1A2 P05177 2/20 0.34
▸ CYP3A4 P08684 2/20 0.34
▸ CYP2D6 P10635 2/20 0.34
▸ MEN1 O00255 1/20 0.34
▸ CYP2C9 P11712 1/20 0.34
▸ CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26188241 0.88 OPRM1 (0.38) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL26188237 0.87 ADORA3 (0.39) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL18308568 0.85 OPRM1 (0.36) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL18308566 0.85 OPRM1 (0.36) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL13346710 0.85 OPRM1 (0.44) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL18308565 0.84 ADORA3 (0.37) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL13346707 0.83 OPRM1 (0.43) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL19754820 0.83 OPRM1 (0.43) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL19753668 0.83 OPRM1 (0.43) OPRM1OPRD1OPRK1DRD3APOBEC3A
SCHEMBL24944589 0.81 OPRM1 (0.49) OPRM1OPRD1OPRK1DRD3SLC22A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 — — US disclosed
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