SCHEMBL27436734

SCHEMBL27436734

O=C(OCCF)OCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.49
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
CA12 O43570 2/20 0.46
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
CA9 Q16790 2/20 0.46
MAPT P10636 2/20 0.38
ATM Q13315 1/20 0.38
TSHR P16473 1/20 0.37
GRIN2D O15399 2/20 0.36
GRIN3B O60391 2/20 0.36
GRIN1 Q05586 2/20 0.36
GRIN2A Q12879 2/20 0.36
GRIN2B Q13224 2/20 0.36
GRIN2C Q14957 2/20 0.36
GRIN3A Q8TCU5 2/20 0.36
EPHX2 P34913 1/20 0.35
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29254327 0.87 ALDH1A1 (0.59) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL25380928 0.79 ALDH1A1 (0.48) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL24587010 0.79 ALDH1A1 (0.45) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL27445602 0.79 ALDH1A1 (0.60) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL24587719 0.78 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL24586992 0.78 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL11991798 0.77 ALDH1A1 (0.53) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL29757005 0.77 ALDH1A1 (0.62) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL16451613 0.76 ALDH1A1 (0.56) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL26452896 0.76 ALDH1A1 (0.49) ALDH1A1MEN1KMT2AL3MBTL1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed