SCHEMBL27436742

SCHEMBL27436742

FCCOC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.40
ALDH1A1 P00352 9/20 0.37
MEN1 O00255 4/20 0.37
KMT2A Q03164 4/20 0.37
HTT P42858 2/20 0.37
GRIN2D O15399 5/20 0.37
GRIN3B O60391 5/20 0.37
GRIN1 Q05586 5/20 0.37
GRIN2A Q12879 5/20 0.37
GRIN2B Q13224 5/20 0.37
GRIN2C Q14957 5/20 0.37
GRIN3A Q8TCU5 5/20 0.37
CYP1A2 P05177 2/20 0.35
CYP2C9 P11712 2/20 0.35
CYP2C19 P33261 2/20 0.35
CYP3A4 P08684 1/20 0.35
LMNA P02545 7/20 0.34
SMN1; SMN2 Q16637 5/20 0.33
TSHR P16473 3/20 0.33
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5933135 0.81 GRIN2D (0.44) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL4389248 0.81 ALDH1A1 (0.41) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL482480 0.78 ALDH1A1 (0.41) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL2340118 0.77 ALDH1A1 (0.39) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL5933126 0.76 ALDH1A1 (0.37) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL4389244 0.76 ALDH1A1 (0.41) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL5933093 0.76 ALDH1A1 (0.47) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL5933278 0.76 ALDH1A1 (0.37) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL482478 0.76 ALDH1A1 (0.37) NPSR1ALDH1A1MEN1KMT2AHTT
SCHEMBL5933271 0.76 ALDH1A1 (0.41) NPSR1ALDH1A1MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed