Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.41 |
| ▸ | NAAA | Q02083 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | SLC1A3 | P43003 | 3/20 | 0.37 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.37 |
| ▸ | SLC1A1 | P43005 | 3/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.35 |
| ▸ | CTSK | P43235 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27712709 | 0.88 | LMNA (0.48) | LMNASLC1A3SLC1A2SLC1A1PSMB5 | |
| SCHEMBL8984845 | 0.86 | CYP19A1 (0.53) | CYP19A1EPHX1NAAAL3MBTL1HTT | |
| SCHEMBL27874692 | 0.84 | CYP19A1 (0.50) | CYP19A1LMNAEPHX1NAAAL3MBTL1 | |
| SCHEMBL28004194 | 0.81 | LMNA (0.43) | LMNAL3MBTL1SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL27437481 | 0.81 | EPHX1 (0.44) | CYP19A1EPHX1NAAAL3MBTL1HTT | |
| SCHEMBL2908890 | 0.78 | LMNA (0.52) | LMNASLC1A3SLC1A2SLC1A1PSMB5 | |
| SCHEMBL21671190 | 0.78 | LMNA (0.52) | LMNASLC1A3SLC1A2SLC1A1PSMB5 | |
| SCHEMBL21671173 | 0.78 | LMNA (0.52) | LMNASLC1A3SLC1A2SLC1A1PSMB5 | |
| SCHEMBL28814763 | 0.77 | CYP19A1 (0.45) | CYP19A1EPHX1NAAAL3MBTL1HTT | |
| SCHEMBL3013492 | 0.77 | LMNA (0.50) | LMNASLC1A3SLC1A2SLC1A1PSMB5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |