SCHEMBL27437489

SCHEMBL27437489

CCCOC(=O)C(C)C(=O)OC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
ZDHHC7 Q9NXF8 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
HCAR2 Q8TDS4 1/20 0.38
ALDH1A1 P00352 3/20 0.36
HSD17B10 Q99714 2/20 0.36
MAPT P10636 1/20 0.36
TAS1R3 Q7RTX0 1/20 0.36
TAS1R1 Q7RTX1 1/20 0.36
CA14 Q9ULX7 2/20 0.35
LMNA P02545 1/20 0.35
TSHR P16473 2/20 0.35
MAPK1 P28482 1/20 0.35
ESR1 P03372 1/20 0.34
CHRM1 P11229 1/20 0.34
SLC6A2 P23975 1/20 0.34
KDR P35968 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
KDM4E B2RXH2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4206328 0.91 HCAR2 (0.43) HCAR2ALDH1A1HSD17B10LMNATSHR
SCHEMBL27508618 0.87 ALDH1A1 (0.50) CA1CA2ZDHHC7SMN1; SMN2HCAR2
SCHEMBL14865344 0.84 ALDH1A1 (0.42) HCAR2ALDH1A1HSD17B10MAPTLMNA
SCHEMBL10515811 0.84 EPHX1 (0.53) CA1CA2ZDHHC7HCAR2ALDH1A1
SCHEMBL6050255 0.82 HCAR2 (0.38) CA1CA2ZDHHC7HCAR2ALDH1A1
SCHEMBL16368799 0.82 KMT2A (0.41) CA1CA2SMN1; SMN2ALDH1A1HSD17B10
SCHEMBL27697592 0.82 TSHR (0.39) CA1CA2SMN1; SMN2ALDH1A1TAS1R3
SCHEMBL4658427 0.81 MGAM (0.46) CA1CA2ZDHHC7SMN1; SMN2ALDH1A1
Ammonia Solution, Strong SCHEMBL11065656 0.81 MGAM (0.46) CA1CA2ZDHHC7SMN1; SMN2ALDH1A1
SCHEMBL9065600 0.80 SMN1; SMN2 (0.37) CA1CA2SMN1; SMN2CA14TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
CN-113336726-B Preparation method of brivaracetam intermediate 浙江工业大学 2022-11-25 CN disclosed
CN-101125833-A Optically active bisoxazoline compounds, process for production of the same and use thereof SUMITOMO CHEMICAL CO (JP) 2008-02-20 CN disclosed
CN-1771236-A Optically active bisoxazoline compound, process for producing the same, and use thereof SUMITOMO CHEMICAL CO (JP) 2006-05-10 CN disclosed