SCHEMBL274523

SCHEMBL274523

C=Cc1ccc(OCC(CO)(CO)COc2ccc(C=C)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 2/20 0.44
CHRNB4 P30926 2/20 0.44
CHRNA3 P32297 2/20 0.44
CHRNA7 P36544 2/20 0.44
CHRNA4 P43681 2/20 0.44
ALDH1A1 P00352 4/20 0.41
MAPT P10636 1/20 0.35
TP53 P04637 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
HIF1A Q16665 2/20 0.32
CYP3A4 P08684 1/20 0.32
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
TSHR P16473 1/20 0.32
EPAS1 Q99814 1/20 0.32
GAA P10253 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14395356 0.78 TDP1 (0.43) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL21500429 0.78 HIF1A (0.38) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL9463679 0.78 ALDH1A1 (0.50) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14341692 0.77 CHRNA7 (0.46) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL2998505 0.77 CHRNB2 (0.46) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL887953 0.77 CHRNA7 (0.50) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL18561113 0.76 CHRNB2 (0.42) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL623205 0.75 CHRNA7 (0.56) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL10901058 0.74 ALDH1A1 (0.52) ALDH1A1MEN1KMT2A
SCHEMBL23749934 0.74 HIF1A (0.39) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
US-9465142-B2 Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
EP-2131239-B1 Processing liquid for lithographic printing plate development and method of producing lithographic printing plates FUJIFILM CORP (JP) 2016-03-23 EP disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150130008-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-14 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-20150124152-A1 NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE FUJIFILM CORPORATION (JP) 2015-05-07 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8735026-B2 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8303860-B2 Colored curable composition, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2012-11-06 US disclosed
EP-2042309-A2 Method of producing a negative planographic printing plate FUJIFILM Corporation (JP) 2009-04-01 EP disclosed
US-7374863-B2 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light FUJIFILM CORPORATION (JP) 2008-05-20 US disclosed
US-7374863-B2 Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light FUJIFILM CORPORATION (JP) 2008-05-20 US disclosed
US-20080057437-A1 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2008-03-06 US disclosed
US-20080057437-A1 heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern FUJIFILM CORPORATION (JP) 2008-03-06 US disclosed
US-20070072126-A1 Method of producing photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070072126-A1 Method of producing photosensitive planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070059643-A1 Method of producing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
US-20070059643-A1 Method of producing photosensitive planographic printing plate FUJI PHOTO FILM CO., LTD. 2007-03-15 US disclosed
EP-1762896-A2 Method of producing photosensitive planographic printing plate FUJIFILM Corporation (JP) 2007-03-14 EP disclosed