SCHEMBL2745792

SCHEMBL2745792

O=C(O)c1ccc(C23CC4CC(C2)CC(c2ccc(C(=O)O)cc2)(C4)C3)cc1

nearest known ligand 0.50

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
PGR P06401 6/20 0.50
ALDH1A1 P00352 2/20 0.50
MEN1 O00255 2/20 0.49
KMT2A Q03164 2/20 0.49
GRIN2D O15399 1/20 0.49
GRIN3B O60391 1/20 0.49
GRIN1 Q05586 1/20 0.49
GRIN2A Q12879 1/20 0.49
GRIN2B Q13224 1/20 0.49
GRIN2C Q14957 1/20 0.49
GRIN3A Q8TCU5 1/20 0.49
NPC1 O15118 1/20 0.48
RAB9A P51151 1/20 0.48
HSD11B1 P28845 1/20 0.47
RARA P10276 1/20 0.47
RARB P10826 1/20 0.47
RARG P13631 1/20 0.47
LMNA P02545 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747023 0.91 HIF1A (0.46) PGRALDH1A1MEN1KMT2ARAB9A
SCHEMBL422261 0.89 NPC1 (0.56) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL5084601 0.89 TSHR (0.46) PGRALDH1A1MEN1KMT2ANPC1
SCHEMBL5563784 0.88 HIF1A (0.51) PGRMEN1KMT2ANPC1LMNA
Hydrochloric Acid SCHEMBL2710121 0.87 NPC1 (0.54) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL25309350 0.85 TSHR (0.50) ALDH1A1MEN1KMT2ANPC1RAB9A
SCHEMBL5568183 0.84 GRIN2D (0.44) PGRALDH1A1GRIN2DGRIN3BGRIN1
SCHEMBL5084654 0.82 TSHR (0.57) ALDH1A1
SCHEMBL11549869 0.82 RARA (0.43) PGRALDH1A1MEN1KMT2AGRIN2D
SCHEMBL22453210 0.80 NPC1 (0.59) ALDH1A1MEN1KMT2ANPC1RARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120010182-A Photosensitive resin composition and photoresist 常州力得尔电子新材料有限公司 2025-05-16 CN claimed
US-4142036-A Polyphenylcarboxylic acid adamantane compounds and polymers prepared therefrom STANDARD OIL COMPANY (INDIANA) (US) 1979-02-27 US claimed
CN-120010182-A Photosensitive resin composition and photoresist 常州力得尔电子新材料有限公司 2025-05-16 CN disclosed
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed
EP-1683822-A1 PREPOLYMER, PREPOLYMER COMPOSITION, HIGH MOLECULAR WEIGHT POLYMER HAVING STRUCTURE CONTAINING HOLE AND ELECTRICALLY INSULATING FILM Daicel Chemical Industries, Ltd. (JP) 2006-07-26 EP disclosed
US-4142036-A Polyphenylcarboxylic acid adamantane compounds and polymers prepared therefrom STANDARD OIL COMPANY (INDIANA) (US) 1979-02-27 US disclosed