Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TNK2 | Q07912 | 2/20 | 0.41 |
| ▸ | GPR119 | Q8TDV5 | 3/20 | 0.39 |
| ▸ | BUB1 | O43683 | 1/20 | 0.36 |
| ▸ | NPBWR1 | P48145 | 1/20 | 0.36 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | BCHE | P06276 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.36 |
| ▸ | MMP13 | P45452 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.35 |
| ▸ | ABL1 | P00519 | 1/20 | 0.35 |
| ▸ | EGFR | P00533 | 1/20 | 0.35 |
| ▸ | HCK | P08631 | 1/20 | 0.35 |
| ▸ | SRC | P12931 | 1/20 | 0.35 |
| ▸ | KDR | P35968 | 1/20 | 0.35 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.35 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.35 |
| ▸ | MTOR | P42345 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2725204 | 0.89 | KCNK3 (0.40) | TNK2GPR119BUB1BCHEHSP90AA1 | |
| SCHEMBL15020446 | 0.88 | TNK2 (0.45) | TNK2GPR119BCHELMNA | |
| SCHEMBL27904258 | 0.86 | KDM4E (0.35) | TNK2GPR119KMT2ALMNA | |
| SCHEMBL13527975 | 0.86 | GPR119 (0.39) | TNK2GPR119BUB1BCHEHSP90AA1 | |
| SCHEMBL25736844 | 0.79 | MAPT (0.38) | TNK2GPR119KMT2APIK3CD | |
| SCHEMBL5389788 | 0.79 | GPR119 (0.39) | TNK2GPR119BUB1BCHEHSP90AA1 | |
| SCHEMBL2329415 | 0.79 | TNK2 (0.43) | TNK2GPR119BUB1BCHEEGFR | |
| SCHEMBL23213623 | 0.79 | HSP90AA1 (0.41) | TNK2GPR119HSP90AA1HSP90AB1PIK3CD | |
| SCHEMBL29795977 | 0.79 | HSP90AA1 (0.41) | TNK2GPR119HSP90AA1HSP90AB1PIK3CD | |
| SCHEMBL16808193 | 0.78 | GABRP (0.37) | TNK2GPR119 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108139691-A | Processing liquid and pattern forming method | 富士胶片株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-105377747-B | Microfluidic device and its manufacture method, stream formation photosensitive polymer combination | JSR株式会社 | 2017-12-08 | — | — | CN | disclosed |
| CN-107111253-A | Organic processing liquid and pattern forming method | 富士胶片株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-106066575-A | The manufacture method of microfluidic device, microfluidic device and microfluidic device manufacture photosensitive polymer combination | JSR株式会社 | 2016-11-02 | — | — | CN | disclosed |
| CN-103019030-B | Formation method, lens and the negative-type photosensitive constituent of lens | JSR CORP. (JP) | 2016-05-04 | — | — | CN | disclosed |
| CN-105377747-A | Microfluidic device and process for producing same, and photosensitive resin composition for forming flow path | JSR CORP | 2016-03-02 | — | — | CN | disclosed |
| CN-105103051-A | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film, and method for producing electronic device and electronic device using same | FUJIFILM CORP | 2015-11-25 | — | — | CN | disclosed |
| CN-102109760-B | Resist pattern forming method | JSR CORP | 2015-04-15 | — | — | CN | disclosed |
| CN-102089709-B | Radiation-sensitive resin composition | JSR CORP | 2013-10-30 | — | — | CN | disclosed |
| CN-102150083-B | Radiation-sensitive resin composition, and resist pattern formation method | JSR CORP | 2013-09-04 | — | — | CN | disclosed |
| CN-1845941-A | Photoresist polymer compositions | JSR CORP (JP) | 2006-10-11 | — | — | CN | disclosed |
| CN-1842551-A | Acrylic polymers and radiation-sensitive resin compositions | JSR CORP (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1249126-C | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORP (JP) | 2006-04-05 | — | — | CN | disclosed |
| CN-1732408-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-02-08 | — | — | CN | disclosed |
| CN-1714110-A | Acrylic copolymer and radiation-sensitive resin composition | JSR CORP (JP) | 2005-12-28 | — | — | CN | disclosed |
| CN-1708728-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-12-14 | — | — | CN | disclosed |
| CN-1505651-A | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR��ʽ���� | 2004-06-16 | — | — | CN | disclosed |
| CN-1501166-A | Radiation-sensitive resin composition | JSR株式会社 | 2004-06-02 | — | — | CN | disclosed |
| CN-1332205-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2002-01-23 | — | — | CN | disclosed |
| CN-1156995-A | Vitronectin receptor antagonists | SMITHKLINE BEECHAM CORP (US) | 1997-08-13 | — | — | CN | disclosed |