SCHEMBL2746546

SCHEMBL2746546

O=C(O)c1ccccc1Oc1ccccc1C1(c2ccccc2Oc2ccccc2C(=O)O)C2CC3CC(C2)CC1(C12CC4CC(CC(C4)C1)C2)C3

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 6/20 0.50
▸ HTT P42858 1/20 0.42
▸ EPHX2 P34913 1/20 0.40
▸ CNR2 P34972 6/20 0.38
▸ FAAH O00519 4/20 0.38
▸ CNR1 P21554 2/20 0.38
▸ KMT2A Q03164 3/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ P2RX7 Q99572 1/20 0.36
▸ RECQL P46063 1/20 0.35
▸ ALDH1A1 P00352 4/20 0.35
▸ HPGD P15428 4/20 0.35
▸ HSD17B10 Q99714 4/20 0.35
▸ ESR1 P03372 1/20 0.35
▸ ITGB3 P05106 1/20 0.35
▸ ITGA2B P08514 1/20 0.35
▸ HMGB1 P09429 1/20 0.35
▸ TSHR P16473 1/20 0.35
▸ GGT1 P19440 1/20 0.35
▸ PTGS1 P23219 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2746801 0.86 KDM4E (0.45) KDM4EHTTEPHX2CNR2FAAH
SCHEMBL2707891 0.85 KDM4E (0.40) KDM4EEPHX2TDP1
SCHEMBL2746811 0.85 KDM4E (0.47) KDM4EHTTEPHX2CNR2FAAH
SCHEMBL2746813 0.84 SRD5A2 (0.39) KDM4EEPHX2CNR2FAAHKMT2A
SCHEMBL2745706 0.82 KDM4E (0.45) KDM4EHTTEPHX2CNR2FAAH
SCHEMBL2745708 0.81 AKR1C3 (0.45) EPHX2CNR2FAAHKMT2AMEN1
SCHEMBL2746617 0.79 KDM4E (0.53) KDM4EHTTEPHX2CNR2FAAH
SCHEMBL2746772 0.76 KDM4E (0.52) KDM4EHTTEPHX2CNR2FAAH
SCHEMBL4411558 0.76 NCOA1 (0.40) EPHX2KMT2AMEN1ALDH1A1TSHR
SCHEMBL2709954 0.73 EPHX2 (0.32) KDM4EHTTEPHX2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 — — US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 — — US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 — — US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 — — US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 — — EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 — — EP disclosed
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