SCHEMBL2746617

SCHEMBL2746617

O=C(O)c1ccccc1OC1(Oc2ccccc2C(=O)O)C2CC3CC(C2)CC1(C12CC4CC(CC(C4)C1)C2)C3

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 5/20 0.53
▸ EPHX2 P34913 1/20 0.42
▸ CNR2 P34972 6/20 0.40
▸ FAAH O00519 4/20 0.40
▸ CNR1 P21554 2/20 0.39
▸ KMT2A Q03164 2/20 0.38
▸ P2RX7 Q99572 2/20 0.38
▸ MEN1 O00255 1/20 0.38
▸ ALDH1A1 P00352 4/20 0.37
▸ HPGD P15428 4/20 0.37
▸ HSD17B10 Q99714 4/20 0.37
▸ ESR1 P03372 1/20 0.37
▸ ITGB3 P05106 1/20 0.37
▸ ITGA2B P08514 1/20 0.37
▸ HMGB1 P09429 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ GGT1 P19440 1/20 0.37
▸ PTGS1 P23219 1/20 0.37
▸ PTGS2 P35354 1/20 0.37
▸ BLM P54132 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2746546 0.79 KDM4E (0.50) KDM4EEPHX2CNR2FAAHCNR1
SCHEMBL2710157 0.79 ALDH1A1 (0.38) KDM4EEPHX2KMT2AP2RX7MEN1
SCHEMBL4309686 0.78 KDM4E (0.64) KDM4EEPHX2CNR2FAAHCNR1
SCHEMBL2746811 0.76 KDM4E (0.47) KDM4EEPHX2CNR2FAAHCNR1
SCHEMBL2748333 0.76 EPHX2 (0.43) KDM4EEPHX2CNR2KMT2AMEN1
SCHEMBL2746801 0.76 KDM4E (0.45) KDM4EEPHX2CNR2FAAHKMT2A
SCHEMBL2747616 0.75 EPHX2 (0.44) KDM4EEPHX2CNR2FAAHKMT2A
SCHEMBL2745706 0.74 KDM4E (0.45) KDM4EEPHX2CNR2FAAHCNR1
SCHEMBL2746395 0.72 KDM4E (0.57) KDM4EEPHX2CNR2FAAHCNR1
SCHEMBL2707891 0.70 KDM4E (0.40) KDM4EEPHX2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 — — US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 — — US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 — — US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 — — US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 — — EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 — — EP disclosed
Send feedback