SCHEMBL2746811

SCHEMBL2746811

O=C(O)c1ccccc1Oc1ccc(C2(c3ccc(Oc4ccccc4C(=O)O)cc3)C3CC4CC(C3)CC2(C23CC5CC(CC(C5)C2)C3)C4)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 1/20 0.47
▸ HIF1A Q16665 1/20 0.41
▸ EPAS1 Q99814 1/20 0.41
▸ EPHX2 P34913 3/20 0.39
▸ CTNNB1 P35222 1/20 0.37
▸ HTT P42858 1/20 0.36
▸ CNR2 P34972 4/20 0.36
▸ FAAH O00519 3/20 0.36
▸ CNR1 P21554 2/20 0.36
▸ DHODH Q02127 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ POLB P06746 1/20 0.35
▸ GAA P10253 1/20 0.35
▸ CRHBP P24387 1/20 0.35
▸ FNTA P49354 1/20 0.35
▸ FNTB P49356 1/20 0.35
▸ CRHR2 Q13324 1/20 0.35
▸ SCN1A P35498 1/20 0.34
▸ SCN2A Q99250 1/20 0.34
▸ SCN3A Q9NY46 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2745706 0.88 KDM4E (0.45) KDM4EHIF1AEPAS1EPHX2CTNNB1
SCHEMBL2746546 0.85 KDM4E (0.50) KDM4EHIF1AEPAS1EPHX2HTT
SCHEMBL2746813 0.81 SRD5A2 (0.39) KDM4EEPHX2CNR2FAAHMEN1
SCHEMBL2707891 0.81 KDM4E (0.40) KDM4EEPHX2POLB
SCHEMBL2746801 0.78 KDM4E (0.45) KDM4EHIF1AEPAS1EPHX2HTT
SCHEMBL2747865 0.77 EPHX2 (0.43) KDM4EEPHX2ALDH1A1MEN1KMT2A
SCHEMBL2746617 0.76 KDM4E (0.53) KDM4EHIF1AEPAS1EPHX2HTT
SCHEMBL2746775 0.76 KDM4E (0.50) KDM4EHIF1AEPAS1EPHX2CTNNB1
SCHEMBL2710535 0.76 EPHX2 (0.36) KDM4EHIF1AEPAS1EPHX2POLB
SCHEMBL2745708 0.74 AKR1C3 (0.45) HIF1AEPAS1EPHX2CNR2FAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 — — US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 — — US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 — — US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 — — US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 — — EP disclosed
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