SCHEMBL2746700

SCHEMBL2746700

O=C(O)c1cccc(C(=O)O)c1Oc1ccccc1C#Cc1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.51
RAB9A P51151 1/20 0.51
FFAR1 O14842 4/20 0.43
MAPK1 P28482 1/20 0.43
HNF4A P41235 1/20 0.43
KDM4E B2RXH2 5/20 0.42
HPGD P15428 5/20 0.42
HSD17B10 Q99714 5/20 0.42
ALDH1A1 P00352 5/20 0.42
MAPT P10636 2/20 0.42
MEN1 O00255 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP3A4 P08684 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
KMT2A Q03164 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HTT P42858 1/20 0.41
AKR1C2 P52895 1/20 0.40
AKR1C1 Q04828 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747585 0.85 NPC1 (0.49) NPC1RAB9AFFAR1HNF4AKDM4E
SCHEMBL2747642 0.81 MAPK1 (0.45) MAPK1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL28235528 0.78 PYGL (0.51) NPC1RAB9AHNF4AKDM4ETDP1
SCHEMBL28632141 0.78 HTT (0.61) MAPK1KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL29479413 0.78 NPC1 (0.72) NPC1RAB9AFFAR1HNF4AKDM4E
SCHEMBL2256468 0.78 NPC1 (0.72) NPC1RAB9AFFAR1HNF4AKDM4E
SCHEMBL9338590 0.78 HTT (0.46) NPC1RAB9AMAPK1KDM4EHPGD
SCHEMBL3839249 0.78 MAPT (0.59) NPC1RAB9AFFAR1MAPK1KDM4E
SCHEMBL16720332 0.78 NPC1 (0.62) NPC1RAB9AFFAR1MAPK1HNF4A
SCHEMBL2747620 0.77 RAB9A (0.43) NPC1RAB9AFFAR1HNF4AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed