SCHEMBL2747510

SCHEMBL2747510

[c]1c(C23CC4CC(CC(C4)C2)C3)c(C23CC4CC(CC(C4)C2)C3)c(C23CC4CC(CC(C4)C2)C3)c(C23CC4CC(CC(C4)C2)C3)c1C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.34
ALDH1A1 P00352 1/20 0.34
EPHX2 P34913 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
GRIN2D O15399 2/20 0.32
GRIN3B O60391 2/20 0.32
GRIN1 Q05586 2/20 0.32
GRIN2A Q12879 2/20 0.32
GRIN2B Q13224 2/20 0.32
GRIN2C Q14957 2/20 0.32
GRIN3A Q8TCU5 2/20 0.32
MEN1 O00255 1/20 0.31
POLB P06746 1/20 0.31
GAA P10253 1/20 0.31
GFER P55789 1/20 0.31
KMT2A Q03164 1/20 0.31
USP2 O75604 1/20 0.31
MAPT P10636 1/20 0.31
THRB P10828 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2747763 0.74 EPHX2 (0.39) LMNAEPHX2GRIN2DGRIN3BGRIN1
SCHEMBL2747704 0.72
SCHEMBL2747581 0.71 ALDH1A1 (0.32) LMNAALDH1A1EPHX2MEN1POLB
SCHEMBL548807 0.70 GAA (0.42) LMNAALDH1A1EPHX2SMN1; SMN2GRIN2D
SCHEMBL548725 0.70 GAA (0.42) LMNAALDH1A1EPHX2SMN1; SMN2GRIN2D
SCHEMBL549901 0.68 GAA (0.41) LMNAALDH1A1EPHX2SMN1; SMN2GRIN2D
SCHEMBL548854 0.67 POLB (0.43) LMNAALDH1A1EPHX2SMN1; SMN2GRIN2D
SCHEMBL2747571 0.66 LMNA (0.35) LMNAALDH1A1EPHX2MEN1POLB
SCHEMBL17965922 0.65 ALDH1A1 (0.42) LMNAALDH1A1EPHX2SMN1; SMN2GRIN2D
SCHEMBL548925 0.65 MEN1 (0.52) LMNAALDH1A1EPHX2SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed