SCHEMBL2747723

SCHEMBL2747723

O=C(O)C1(C(=O)O)C2CC3CC(C2)CC1C3

nearest known ligand 0.42

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 11/20 0.42
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
TSHR P16473 1/20 0.34
GAA P10253 1/20 0.33
THRB P10828 1/20 0.33
CYP2C9 P11712 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28786503 1.00 HSD11B1 (0.42) HSD11B1MEN1KMT2ATSHRGAA
SCHEMBL28786461 0.82 HSD11B1 (0.37) HSD11B1
SCHEMBL28786480 0.82 HSD11B1 (0.37) HSD11B1
SCHEMBL962326 0.76 HSD11B1 (0.41) HSD11B1MEN1KMT2ATSHRTHRB
SCHEMBL5712636 0.74 HSD11B1 (0.40) HSD11B1MEN1KMT2A
SCHEMBL29672367 0.74 ALDH1A1 (0.40) HSD11B1MEN1KMT2ATSHR
SCHEMBL544408 0.74 SLC1A2 (0.44) HSD11B1MEN1KMT2ATHRBCYP2C9
SCHEMBL7812848 0.74 HSD11B1 (0.40) HSD11B1MEN1KMT2ATSHRGAA
SCHEMBL28786460 0.74 ALDH1A1 (0.40) HSD11B1MEN1KMT2ATSHR
Hydrochloric Acid SCHEMBL19834193 0.72 SLC1A2 (0.42) HSD11B1THRBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114727974-A HDAC6 inhibitors and uses thereof 艾科尼佐治疗股份有限公司 2022-07-08 CN disclosed
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed