SCHEMBL2747751

SCHEMBL2747751

Nc1cc(C2(c3ccc(O)c(N)c3)c3cc(C#CC45CC6CC(CC(C6)C4)C5)ccc3-c3ccc(C#CC45CC6CC(CC(C6)C4)C5)cc32)ccc1O

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.35
POLB P06746 1/20 0.35
GAA P10253 1/20 0.35
GFER P55789 1/20 0.35
KMT2A Q03164 1/20 0.35
PDE4D Q08499 2/20 0.34
ESR1 P03372 1/20 0.31
ESR2 Q92731 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5006706 0.95 ESR1 (0.40) MEN1POLBGAAGFERKMT2A
SCHEMBL2747518 0.84 MMP2 (0.34) MEN1KMT2APDE4D
SCHEMBL2707398 0.79 MEN1 (0.55) MEN1POLBGAAGFERKMT2A
SCHEMBL5000843 0.79 MEN1 (0.39) MEN1POLBGAAGFERKMT2A
SCHEMBL5006707 0.78 ESR1 (0.38) MEN1POLBGAAGFERKMT2A
SCHEMBL2707919 0.77 PDE4D (0.43) MEN1GAAKMT2APDE4DESR1
SCHEMBL2710475 0.75 ESR1 (0.38) MEN1GAAKMT2APDE4DESR1
SCHEMBL2748181 0.71 MEN1 (0.34) MEN1POLBGAAGFERKMT2A
SCHEMBL2710154 0.68 MEN1 (0.71) MEN1POLBGAAGFERKMT2A
SCHEMBL1150069 0.68 MEN1 (0.71) MEN1POLBGAAGFERKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed