SCHEMBL2748352

SCHEMBL2748352

C#CC(C)Cc1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 5/20 0.56
CYP1A2 P05177 3/20 0.55
CYP2D6 P10635 3/20 0.55
TSHR P16473 2/20 0.55
CYP3A4 P08684 1/20 0.55
MAOA P21397 5/20 0.52
TAAR1 Q96RJ0 4/20 0.52
SIGMAR1 Q99720 4/20 0.52
SLC6A2 P23975 2/20 0.52
SLC6A4 P31645 1/20 0.52
SLC6A3 Q01959 1/20 0.52
CYP2A6 P11509 1/20 0.52
ADORA2A P29274 1/20 0.52
ADORA1 P30542 1/20 0.52
ADRA2A P08913 1/20 0.52
ADRA2B P18089 1/20 0.52
ADRA2C P18825 1/20 0.52
ADRA1A P35348 1/20 0.52
SNCA P37840 1/20 0.52
OPRK1 P41145 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6387963 0.79 SIGMAR1 (0.54) MAOBCYP1A2CYP2D6TSHRCYP3A4
SCHEMBL18099983 0.78 MAOB (0.54) MAOBMAOATAAR1TRPA1
SCHEMBL10012895 0.77 MAOA (0.52) MAOBCYP1A2CYP2D6TSHRCYP3A4
SCHEMBL13593628 0.77 SIGMAR1 (0.52) MAOBCYP1A2CYP2D6TSHRCYP3A4
SCHEMBL14452762 0.77 SIGMAR1 (0.52) MAOBCYP1A2CYP2D6TSHRCYP3A4
SCHEMBL1752148 0.77 SIGMAR1 (0.52) MAOBCYP1A2CYP2D6TSHRCYP3A4
SCHEMBL834993 0.77 TAAR1 (0.52) CYP1A2CYP2D6TSHRCYP3A4MAOA
SCHEMBL8675172 0.77 SIGMAR1 (0.52) MAOBCYP1A2CYP2D6TSHRCYP3A4
SCHEMBL97558 0.77 TAAR1 (0.52) CYP1A2CYP2D6TSHRCYP3A4MAOA
SCHEMBL11231462 0.77 MAOA (0.52) MAOBCYP1A2CYP2D6TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-8178631-B2 Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-05-15 US disclosed
CN-101268119-B Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE CO 2011-08-17 CN disclosed
US-20090214860-A1 Resin Composition, Varnish, Resin Film and Semiconductor Device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2009-08-27 US disclosed
CN-101268119-A Resin composition, varnish, resin film and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-09-17 CN disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1953181-A1 RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Ltd. (JP) 2008-08-06 EP disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed