SCHEMBL27484693

SCHEMBL27484693

CCCC[Si](OC)(OC)OCCCCOCC1CO1

nearest known ligand 0.61

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.61
TDP1 Q9NUW8 1/20 0.61
SMN1; SMN2 Q16637 1/20 0.60
TSHR P16473 2/20 0.53
PDK1 Q15118 1/20 0.35
MAPK1 P28482 1/20 0.34
LMNA P02545 1/20 0.31
SPHK2 Q9NRA0 1/20 0.31
SPHK1 Q9NYA1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23458078 0.94 ALDH1A1 (0.67) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL28262401 0.94 ALDH1A1 (0.67) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL27898415 0.93 ALDH1A1 (0.58) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL28730386 0.93 SMN1; SMN2 (0.57) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL28449500 0.92 TSHR (0.58) ALDH1A1TDP1SMN1; SMN2TSHRMAPK1
SCHEMBL6064293 0.91 ALDH1A1 (0.57) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL28926632 0.90 SMN1; SMN2 (0.57) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL6064005 0.90 SMN1; SMN2 (0.57) ALDH1A1TDP1SMN1; SMN2TSHRPDK1
SCHEMBL28623822 0.90 TSHR (0.55) ALDH1A1TDP1SMN1; SMN2TSHRMAPK1
SCHEMBL6063435 0.88 ALDH1A1 (0.57) ALDH1A1TDP1SMN1; SMN2TSHRPDK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110419087-A Solid electrolytic capacitor assembly AVX CORP 2019-11-05 CN claimed
CN-108475581-A Solid electrolytic capacitor with improved leakage current 阿维科斯公司 2018-08-31 CN claimed
CN-112947000-B Composition for forming silicon-containing EUV resist underlayer film containing sulfonate 日产化学工业株式会社 2024-11-29 CN disclosed
CN-117396811-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-12 CN disclosed
CN-107615168-B Radiation-sensitive composition 日产化学工业株式会社 2023-12-19 CN disclosed
CN-117121652-A Charge-transporting varnish 日产化学株式会社 2023-11-24 CN disclosed
CN-117008420-A Radiation-sensitive composition 日产化学工业株式会社 2023-11-07 CN disclosed
CN-113853662-B Solid electrolytic capacitor 京瓷AVX元器件公司 2023-08-04 CN disclosed
CN-116457911-A Low inductance electrolytic capacitor 京瓷AVX元器件公司 2023-07-18 CN disclosed
CN-110573964-A Negative photosensitive resin composition and cured film 东丽株式会社 2019-12-13 CN disclosed
CN-110459406-A For the solid electrolytic capacitor under the conditions of high-temperature high-humidity AVX CORP 2019-11-15 CN disclosed
CN-1318511-C Asphalt composition containing hydrogenated conjugated diene copolymer ASAHI CHEMICAL CORP (JP) 2007-05-30 CN disclosed
CN-1875063-A Rubber composition for footwear ASAHI CHEMICAL CORP (JP) 2006-12-06 CN disclosed
CN-1246383-C Modified block copolymer compsn. ASAHI CHEMICAL INC (JP) 2006-03-22 CN disclosed
CN-1688640-A Coating composition and method for preparing same BAYER MATERIALSCIENCE AG (DE) 2005-10-26 CN disclosed
CN-1649965-A Asphalt composition ASAHI CHEMICAL CORP (JP) 2005-08-03 CN disclosed
CN-1621451-A Asphalt composition containing hydrogenated conjugated diene copolymer ASAHI CHEMICAL CORP (JP) 2005-06-01 CN disclosed
CN-1198153-C Method for producing anti-reflective film-coated plastic, lens, and anti-reflective film-coated plastic lens HOYA CORP (JP) 2005-04-20 CN disclosed
CN-1520442-A Modified block copolymer composition 旭化成株式会社 2004-08-11 CN disclosed
CN-1428613-A Method for producing anti-reflective film-coated plastic, lens, and anti-reflective film-coated plastic lens HOYA CORP (JP) 2003-07-09 CN disclosed