Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6545145 | 0.86 | LMNA (0.42) | LMNATHRB | |
| SCHEMBL10406158 | 0.79 | TSHR (0.33) | TSHRHSD17B10TDP1 | |
| SCHEMBL28115141 | 0.79 | LMNA (0.50) | LMNATHRBTSHR | |
| SCHEMBL9730228 | 0.79 | — | — | |
| SCHEMBL13770691 | 0.77 | — | — | |
| SCHEMBL1262745 | 0.77 | — | — | |
| SCHEMBL6390822 | 0.77 | — | — | |
| SCHEMBL28776415 | 0.77 | — | — | |
| SCHEMBL11296200 | 0.76 | LMNA (0.36) | LMNATHRB | |
| SCHEMBL7930974 | 0.76 | TDP1 (0.33) | HSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103857751-A | Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film | DONGWOO FINE CHEM CO LTD | 2014-06-11 | — | — | CN | claimed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| WO-2024158178-A1 | THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-08-02 | — | — | WO | disclosed |
| WO-2024147537-A1 | RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-07-11 | — | — | WO | disclosed |
| CN-108241258-B | Resin composition for liquid crystal display device, film for liquid crystal display device, and copolymer | 住友化学株式会社 | 2022-10-18 | — | — | CN | disclosed |
| US-20210114967-A1 | RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD | KANEKA CORPORATION (JP) | 2021-04-22 | — | — | US | disclosed |
| EP-3806593-A1 | RESIST COMPOSITION FOR PATTERN PRINTING USE, AND METHOD FOR MANUFACTURING CIRCUIT PATTERN USING SAME | KANEKA CORPORATION (JP) | 2021-04-14 | — | — | EP | disclosed |
| US-20210103216-A1 | RESIST COMPOSITION FOR PATTERN PRINTING, AND PRODUCTION METHOD OF CIRCUIT PATTERNS USING THE SAME | KANEKA CORPORATION (JP) | 2021-04-08 | — | — | US | disclosed |
| CN-107272342-B | Negative photosensitive resin composition | 东友精细化工有限公司 | 2021-03-05 | — | — | CN | disclosed |
| CN-105938298-B | Negative photosensitive resin composition, photocured pattern formed by using same and image display device | 东友精细化工有限公司 | 2020-12-29 | — | — | CN | disclosed |
| CN-101206402-A | Photosensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2008-06-25 | — | — | CN | disclosed |
| EP-1245585-B1 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORP (JP) | 2008-05-21 | — | — | EP | disclosed |
| CN-1969011-A | Block copolymer composition for asphalt modification, process for producing the same, and asphalt composition | KRATON JSR ELASTOMERS K K (JP) | 2007-05-23 | — | — | CN | disclosed |
| US-7132092-B2 | Metallized mesoporous silicate and method of oxidation with the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-11-07 | — | — | US | disclosed |
| CN-1664707-A | Scouring agent and flushing fluid for the planography | DAICEL CHEM (JP) | 2005-09-07 | — | — | CN | disclosed |
| US-20050090688-A1 | Metallized mesoporous silicate and method of oxidation with the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-04-28 | — | — | US | disclosed |
| US-6838538-B2 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORPORATION (JP) | 2005-01-04 | — | — | US | disclosed |
| EP-1473275-A1 | METALLIZED MESOPOROUS SILICATE AND METHOD OF OXIDATION WITH THE SAME | Sumitomo Chemical Company, Limited (JP) | 2004-11-03 | — | — | EP | disclosed |
| US-20030100683-A1 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR CORPORATION (JP) | 2003-05-29 | — | — | US | disclosed |
| EP-1245585-A2 | Hydrogenated modified polymer, process for producing the same and composition containing the same | JSR Corporation (JP) | 2002-10-02 | — | — | EP | disclosed |