SCHEMBL27490485

SCHEMBL27490485

COC(=O)c1cccc(C(=O)Oc2cc(C)c(O)c(C)c2)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.52
PRSS1 P07477 1/20 0.51
ACR P10323 1/20 0.51
ESR1 P03372 2/20 0.50
ESR2 Q92731 1/20 0.50
POLB P06746 3/20 0.47
LOXL2 Q9Y4K0 1/20 0.46
TSHR P16473 1/20 0.46
CYP4F2 P78329 1/20 0.45
CYP4A11 Q02928 1/20 0.45
KMT2A Q03164 4/20 0.45
MAPT P10636 2/20 0.45
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
XDH P47989 1/20 0.45
CA9 Q16790 1/20 0.45
CA14 Q9ULX7 1/20 0.45
CYP1A2 P05177 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7705090 0.83 KMT2A (0.54) TTRTSHRKMT2AMAPTGAA
SCHEMBL27492250 0.81 KMT2A (0.47) TTRPRSS1ACRESR1ESR2
SCHEMBL10630065 0.80 TSHR (0.62) PRSS1ACRESR1ESR2LOXL2
SCHEMBL8749898 0.80 KMT2A (0.59) PRSS1ACRPOLBLOXL2TSHR
SCHEMBL16675177 0.79 ACR (0.59) PRSS1ACRESR1ESR2POLB
SCHEMBL34953 0.79 TSHR (0.70) POLBLOXL2TSHRCYP4F2CYP4A11
SCHEMBL8054504 0.77 TSHR (0.67) POLBLOXL2TSHRCYP4F2CYP4A11
Methyl Alcohol SCHEMBL28469619 0.77 TSHR (0.67) POLBLOXL2TSHRCYP4F2CYP4A11
SCHEMBL10941453 0.77 TSHR (0.67) POLBLOXL2TSHRCYP4F2CYP4A11
Lithium SCHEMBL29634258 0.77 TSHR (0.67) POLBLOXL2TSHRCYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1208687-C High-resolution photosnesiitve resin composition usable with I-line and method of forming patter AZ ELECTRONIC MATERIALS JAPAN (JP) 2005-06-29 CN disclosed
CN-1401096-A High resolution photosensitive resin composition for i-line and method of forming pattern CLARIANT INT LTD (CH) 2003-03-05 CN disclosed