Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 2/20 | 0.45 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.41 |
| ▸ | MCHR1 | Q99705 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.39 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.38 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.37 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36116 | 0.91 | CLK4 (0.48) | CLK4MAPTKDM4ETP53ALDH1A1 | |
| SCHEMBL22129825 | 0.91 | CLK4 (0.48) | CLK4MAPTKDM4ETP53ALDH1A1 | |
| SCHEMBL10068859 | 0.89 | CLK4 (0.47) | CLK4MAPTKDM4ETP53ALDH1A1 | |
| Ethylene SCHEMBL22497430 | 0.87 | CLK4 (0.46) | CLK4MAPTKDM4ETP53ALDH1A1 | |
| SCHEMBL326391 | 0.87 | CLK4 (0.48) | CLK4MAPTKDM4ETP53ALDH1A1 | |
| SCHEMBL5692393 | 0.84 | SMN1; SMN2 (0.55) | CLK4MAPTKDM4ETP53HPGD | |
| SCHEMBL7114873 | 0.84 | S1PR1 (0.53) | CLK4MAPTKDM4EALDH1A1HPGD | |
| SCHEMBL31555141 | 0.84 | APP (0.47) | APPMCHR1KCNH2ALDH1A1PDE10A | |
| SCHEMBL18344284 | 0.83 | KDM4E (0.44) | CLK4MAPTKDM4ETP53ALDH1A1 | |
| SCHEMBL274973 | 0.83 | GRM5 (0.41) | KCNH2ALDH1A1NPC1RAB9ACYP1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3182204-B1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR USING A POLYMERIZABLE COMPOSITION | FUJIFILM CORP (JP) | 2021-10-20 | — | — | EP | disclosed |
| EP-2109000-B1 | Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same | FUJIFILM CORP (JP) | 2017-02-22 | — | — | EP | disclosed |
| EP-1564591-B1 | Polymerizable composition | FUJIFILM CORP (JP) | 2016-08-03 | — | — | EP | disclosed |
| EP-1403710-B1 | Polymerizable composition | FUJIFILM CORP (JP) | 2015-06-10 | — | — | EP | disclosed |
| EP-2085220-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same | FUJIFILM CORP (JP) | 2015-05-20 | — | — | EP | disclosed |
| US-8822126-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8822126-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate | FUJIFILM CORPORATION (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8669040-B2 | Method of manufacturing relief printing plate and printing plate precursor for laser engraving | FUJIFILM CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| US-8669040-B2 | Method of manufacturing relief printing plate and printing plate precursor for laser engraving | FUJIFILM CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| US-8389198-B2 | Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate | FUJIFILM CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-7179582-B2 | Radical polymerizable composition and lithographic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179582-B2 | Radical polymerizable composition and lithographic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7169529-B2 | Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169529-B2 | Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| WO-2005109098-A1 | PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-11-17 | — | — | WO | disclosed |
| WO-2005093515-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, AND PERMANENT PATTERN AND PROCESS FOR FORMING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| WO-2005091078-A1 | PATTERN FORMING PROCESS AND PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005083522-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-09 | — | — | WO | disclosed |
| WO-2005078776-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-25 | — | — | WO | disclosed |