Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | NPC1 | O15118 | 5/20 | 0.45 |
| ▸ | RAB9A | P51151 | 3/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.42 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.42 |
| ▸ | XDH | P47989 | 1/20 | 0.42 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.42 |
| ▸ | SYK | P43405 | 1/20 | 0.42 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22129825 | 0.96 | CLK4 (0.48) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL36116 | 0.96 | CLK4 (0.48) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL10068859 | 0.95 | CLK4 (0.47) | CLK4MAPTKDM4ETP53NPC1 | |
| Ethylene SCHEMBL22497430 | 0.93 | CLK4 (0.46) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL7114873 | 0.90 | S1PR1 (0.53) | CLK4MAPTKDM4ENPC1RAB9A | |
| SCHEMBL9081804 | 0.90 | CHRNA7 (0.48) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL5692393 | 0.90 | SMN1; SMN2 (0.55) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL18344284 | 0.89 | KDM4E (0.44) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL274985 | 0.87 | APP (0.45) | CLK4MAPTKDM4ETP53NPC1 | |
| SCHEMBL9622140 | 0.87 | MAPT (0.46) | CLK4MAPTKDM4ETP53NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2154162-B1 | REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL | SHOWA DENKO KK (JP) | 2019-07-17 | — | — | EP | disclosed |
| EP-2356182-B1 | RADIATION CURABLE COATING MATERIALS | BASF SE (DE) | 2015-05-06 | — | — | EP | disclosed |
| US-20130299736-A1 | RADIATION-CURABLE COATING MATERIALS | BASE SE (DE) | 2013-11-14 | — | — | US | disclosed |
| US-8399569-B2 | Reactive urethane compound having ether bond, curable composition, and cured material | SHOWA DENKO K.K. (JP) | 2013-03-19 | — | — | US | disclosed |
| EP-1866357-B1 | (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF | SHOWA DENKO KK (JP) | 2012-02-22 | — | — | EP | disclosed |
| US-8092982-B2 | Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib | SAMSUNG SDI CO., LTD. (KR) | 2012-01-10 | — | — | US | disclosed |
| US-8044235-B2 | (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof | SHOWA DENKO K.K. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20110230617-A1 | RADIATION-CURABLE COATING MATERIALS | BASF SE (DE) | 2011-09-22 | — | — | US | disclosed |
| EP-2356182-A1 | RADIATION CURABLE COATING MATERIALS | BASF SE (DE) | 2011-08-17 | — | — | EP | disclosed |
| EP-1812381-B1 | ETHYLENICALLY UNSATURATED GROUP-CONTAINING ISOCYANATE COMPOUND AND PROCESS FOR PRODUCING THE SAME, AND REACTIVE MONOMER, REACTIVE (METH)ACRYLATE POLYMER AND ITS USE | SHOWA DENKO KK (JP) | 2011-02-16 | — | — | EP | disclosed |
| EP-1820064-A2 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2007-08-22 | — | — | EP | disclosed |
| WO-2006058731-A2 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2006-06-08 | — | — | WO | disclosed |
| US-20040157140-A1 | Photosensitive coloring composition, color filter using the composition and method of producing the same | SHOWA DENKO K.K. (JP) | 2004-08-12 | — | — | US | disclosed |
| EP-1002817-B1 | Photocurable composition | SHOWA DENKO KK (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-0915136-B1 | Photocurable paint composition for road markings | SHOWA DENKO KK (JP) | 2004-01-21 | — | — | EP | disclosed |
| US-6486225-B1 | Photocurable composition | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2002-11-26 | — | — | US | disclosed |
| US-6211260-B1 | MARKING ROADS WITH CURABLE PAINT, FILLERS, GLASS BEADS, CATIONIC DYES AND QUATERNARY ORGANIC BORATES | SHOWA DENKO K.K. (JP) | 2001-04-03 | — | — | US | disclosed |
| US-6110987-A | CURED PRODUCTS HAVING AN EXCELLENT APPEARANCE WITHOUT COLORING CAUSED BY POLYMERIZATION INITIATOR | SHOWA DENKO K.K. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-1002817-A2 | Photocurable composition | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2000-05-24 | — | — | EP | disclosed |
| EP-0915136-A1 | Photocurable paint composition for road markings | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1999-05-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110230617-A1 | RADIATION-CURABLE COATING MATERIALS | RAD51, MGMT, RAD54L | CLK4 3429/4885MAPT 34/4885KDM4E 1273/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.