SCHEMBL274973

SCHEMBL274973

Cc1ccc(C#Cc2ccc(-c3nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n3)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRM5 P41594 4/20 0.41
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
HTT P42858 2/20 0.39
CYP1A2 P05177 2/20 0.39
LMNA P02545 1/20 0.39
PTBP1 P26599 1/20 0.39
CYP2C19 P33261 1/20 0.39
TNFSF10 P50591 1/20 0.39
ADK P55263 2/20 0.37
KCNH2 Q12809 2/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA9 Q16790 1/20 0.35
NR1H4 Q96RI1 1/20 0.35
NPSR1 Q6W5P4 2/20 0.35
XBP1 P17861 1/20 0.35
ATM Q13315 1/20 0.35
CYP1A1 P04798 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22129836 0.89 NPC1 (0.41) NPC1RAB9AHTTCYP1A2LMNA
SCHEMBL80269 0.89 NPC1 (0.41) NPC1RAB9AHTTCYP1A2LMNA
SCHEMBL4147627 0.88 NPC1 (0.40) NPC1RAB9AHTTCYP1A2LMNA
SCHEMBL274972 0.85 APP (0.41) GRM5NPC1RAB9AHTTCYP1A2
SCHEMBL274985 0.83 APP (0.45) NPC1RAB9ACYP1A2KCNH2NR1H4
SCHEMBL3312117 0.83 ADK (0.41) NPC1RAB9ACYP1A2LMNAADK
SCHEMBL3310276 0.83 TP53 (0.37) NPC1RAB9ACYP1A2LMNAALDH1A1
SCHEMBL18344281 0.81 SDHB (0.37) NPC1RAB9AHTTCYP1A2LMNA
SCHEMBL8956226 0.80 MAPT (0.43) NPC1RAB9AHTTCYP1A2LMNA
SCHEMBL8412982 0.80 NPC1 (0.38) NPC1RAB9AHTTADORA3ADORA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3182204-B1 PLANOGRAPHIC PRINTING PLATE PRECURSOR USING A POLYMERIZABLE COMPOSITION FUJIFILM CORP (JP) 2021-10-20 EP disclosed
EP-2109000-B1 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same FUJIFILM CORP (JP) 2017-02-22 EP disclosed
EP-1564591-B1 Polymerizable composition FUJIFILM CORP (JP) 2016-08-03 EP disclosed
EP-1403710-B1 Polymerizable composition FUJIFILM CORP (JP) 2015-06-10 EP disclosed
EP-2085220-B1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same FUJIFILM CORP (JP) 2015-05-20 EP disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-8669040-B2 Method of manufacturing relief printing plate and printing plate precursor for laser engraving FUJIFILM CORPORATION (JP) 2014-03-11 US disclosed
US-8669040-B2 Method of manufacturing relief printing plate and printing plate precursor for laser engraving FUJIFILM CORPORATION (JP) 2014-03-11 US disclosed
EP-2106906-B1 Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORP (JP) 2013-08-14 EP disclosed
EP-1839853-A1 Planographic printing plate precursor and stack thereof FUJIFILM Corporation (JP) 2007-10-03 EP disclosed
US-7267925-B2 Photosensitive composition and novel compound used therefor FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
US-7267925-B2 Photosensitive composition and novel compound used therefor FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
EP-1662318-B1 1,3-dihydro-1-oxo-2H-indene derivative FUJIFILM CORP (JP) 2007-06-06 EP disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-20070072113-A1 Photosensitive composition, and lithographic printing plate precursor and image-recording method using the same FUJI PHOTO FILM CO., LTD. 2007-03-29 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 US disclosed
US-7169529-B2 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. (JP) 2007-01-30 US disclosed
US-7169529-B2 Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image FUJI PHOTO FILM CO., LTD. (JP) 2007-01-30 US disclosed