Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13475027 | 0.82 | TSHR (0.30) | TSHR | |
| SCHEMBL274605 | 0.81 | CYP4F2 (0.37) | CYP4F2CYP4A11TSHRHPGDALDH1A1 | |
| SCHEMBL13318049 | 0.80 | TSHR (0.53) | CYP4F2CYP4A11TSHRHPGDALDH1A1 | |
| SCHEMBL1104082 | 0.79 | TSHR (0.37) | CYP4F2CYP4A11TSHRALDH1A1 | |
| SCHEMBL26967726 | 0.76 | ATM (0.50) | CYP4F2CYP4A11TSHRHPGDALDH1A1 | |
| SCHEMBL275009 | 0.75 | TSHR (0.58) | CYP4F2CYP4A11TSHRHPGDALDH1A1 | |
| SCHEMBL15708433 | 0.73 | NAAA (0.50) | CYP4F2CYP4A11TSHRALDH1A1 | |
| SCHEMBL15726599 | 0.73 | NAAA (0.50) | CYP4F2CYP4A11TSHRALDH1A1 | |
| SCHEMBL274762 | 0.72 | — | — | |
| SCHEMBL1104091 | 0.72 | THRB (0.33) | CYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9465142-B2 | Near-infrared absorptive composition, near-infrared cut filter using near-infrared absorptive composition, method for manufacturing near-infrared cut filter, and camera module and method for manufacturing camera module | FUJIFILM CORPORATION (JP) | 2016-10-11 | — | — | US | disclosed |
| US-20150130008-A1 | NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE | FUJIFILM CORPORATION (JP) | 2015-05-14 | — | — | US | disclosed |
| US-20150124152-A1 | NEAR-INFRARED ABSORPTIVE COMPOSITION, NEAR-INFRARED CUT FILTER USING NEAR-INFRARED ABSORPTIVE COMPOSITION, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, AND CAMERA MODULE AND METHOD FOR MANUFACTURING CAMERA MODULE | FUJIFILM CORPORATION (JP) | 2015-05-07 | — | — | US | disclosed |
| US-8735026-B2 | Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8303860-B2 | Colored curable composition, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2012-11-06 | — | — | US | disclosed |
| US-8133654-B2 | Laser-decomposable resin composition and laser-decomposable pattern-forming material and flexographic printing plate precursor of laser engraving type using the same | FUJIFILM CORPORATION (JP) | 2012-03-13 | — | — | US | disclosed |
| US-20110146516-A1 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110104596-A1 | POLYMERIZABLE COMPOSITION, LIGHT-BLOCKING COLOR FILTER FOR SOLID-STATE IMAGING DEVICE, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-20110017084-A1 | IMMERSION TYPE AUTOMATIC DEVELOPING APPARATUS FOR LITHOGRAPHIC PRINTING PLATE AND AUTOMATIC DEVELOPING METHOD | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20110020757-A1 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20100068470-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100055615-A1 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-03-04 | — | — | US | disclosed |
| US-20090311494-A1 | RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND PROCESS FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090246653-A1 | RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND METHOD OF MANUFACTURING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-7531288-B2 | Negative-working excellent in preservation stability and exhibits high sensitivity and good printing durability; hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7531291-B2 | heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20090099320-A1 | LASER-DECOMPOSABLE RESIN COMPOSITION AND LASER-DECOMPOSABLE PATTERN-FORMING MATERIAL AND FLEXOGRAPHIC PRINTING PLATE PRECURSOR OF LASER ENGRAVING TYPE USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090087790-A1 | METHOD OF PRODUCING A NEGATIVE PLANOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-7374863-B2 | Polyurethane binder, photoinitiator, and acrylic acid; for use as image recording layer of negative lithographic printing plate precursor; drawing with laser light | FUJIFILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20080057437-A1 | heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern | FUJIFILM CORPORATION (JP) | 2008-03-06 | — | — | US | disclosed |