SCHEMBL27547767

SCHEMBL27547767

CC1CCC(=O)C(=Cc2ccc(N=[N+]=[N-])cc2)C1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 6/20 0.38
▸ RAB9A P51151 6/20 0.38
▸ MAPT P10636 5/20 0.38
▸ HTT P42858 3/20 0.38
▸ MAPK1 P28482 2/20 0.38
▸ HSP90AA1 P07900 1/20 0.38
▸ SMN1; SMN2 Q16637 3/20 0.34
▸ HPGD P15428 1/20 0.34
▸ SMO Q99835 2/20 0.33
▸ PTGS2 P35354 1/20 0.33
▸ AKR1C3 P42330 1/20 0.33
▸ AKR1C1 Q04828 1/20 0.33
▸ KMT2A Q03164 3/20 0.32
▸ MITF O75030 1/20 0.32
▸ NSD2 O96028 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ ATM Q13315 1/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ CA1 P00915 1/20 0.32
▸ CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28556832 0.88 NPC1 (0.30) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL28506358 0.88 MAPT (0.43) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL28392156 0.85 TXNRD1 (0.34) SMOPTGS2SLC6A3
SCHEMBL27641557 0.84 MAPT (0.36) NPC1RAB9AMAPTHTTHSP90AA1
SCHEMBL29145325 0.84 MAPT (0.35) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL13886925 0.83 MAPT (0.55) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL13861280 0.83 MAPT (0.55) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL13858828 0.83 MAPT (0.55) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL13882616 0.83 MAPT (0.55) NPC1RAB9AMAPTHTTMAPK1
SCHEMBL16280615 0.83 MAPT (0.41) NPC1RAB9AMAPTHTTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115197664-A Optical adhesive composition, optical adhesive film and method for producing optical adhesive film 业成科技(成都)有限公司 2022-10-18 — — CN claimed
CN-1325505-A Photocurable and photopatternable hydrogel matrix based on azlactone copolymers MINNESOTA MINING & MFG (US) 2001-12-05 — — CN claimed
CN-111123649-B Negative photoresist composition containing high heat resistance carboxyl phenolic resin 苏州瑞红电子化学品有限公司 2024-01-30 — — CN disclosed
CN-114512296-A Superconducting coil device and method for manufacturing the same 公益财团法人铁道综合技术研究所 2022-05-17 — — CN disclosed
CN-110574130-B Use of polymerizable composition 公益财团法人铁道综合技术研究所 2022-04-19 — — CN disclosed
WO-2022045204-A1 CYCLOOLEFIN RESIN CURED PRODUCT HAVING OXYGEN BARRIER PROPERTIES RIMTEC株式会社 2022-03-03 — — WO disclosed
CN-113994257-A Photosensitive polyimide resin composition 合肥汉之和新材料科技有限公司 2022-01-28 — — CN disclosed
CN-112204087-A Composite material and composite material molded body RIMTEC株式会社 2021-01-08 — — CN disclosed
CN-109153197-B Method for producing composite material molded body RIMTEC株式会社 2020-11-03 — — CN disclosed
CN-108602940-B Polymerizable composition and composite material RIMTEC株式会社 2020-09-01 — — CN disclosed
CN-111123649-A Negative photoresist composition containing high-heat-resistance carboxyl phenolic resin 苏州瑞红电子化学品有限公司 2020-05-08 — — CN disclosed
CN-103596770-B Original edition of lithographic printing plate and method for platemaking thereof FUJIFILM CORP. (JP) 2015-10-07 — — CN disclosed
CN-102548769-B Lithographic printing plate precursor FUJIFILM CORP. (JP) 2015-08-12 — — CN disclosed
CN-104619512-A Original planographic printing plate, and plate making method FUJIFILM CORP 2015-05-13 — — CN disclosed
CN-102821969-B Master planographic printing plate and manufacturing method therefor FUJIFILM CORP 2014-12-03 — — CN disclosed
CN-102520584-B Photosensitive benzocyclobutene resin compound and preparation method thereof as well as patterning method thereof UNIV FUDAN 2014-05-07 — — CN disclosed
CN-102227316-B Lithographic printing plate precursor, lithographic printing plate making method and polymerizable monomer FUJI PHOTO FILM CO LTD 2014-04-02 — — CN disclosed
CN-102821968-A Planographic printing master plate and production method therefor FUJIFILM CORP 2012-12-12 — — CN disclosed
CN-102520584-A Photosensitive benzocyclobutene resin compound and preparation method thereof as well as patterning method thereof UNIV FUDAN 2012-06-27 — — CN disclosed
CN-1325505-A Photocurable and photopatternable hydrogel matrix based on azlactone copolymers MINNESOTA MINING & MFG (US) 2001-12-05 — — CN disclosed
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