SCHEMBL27547768

SCHEMBL27547768

[N-]=[N+]=Nc1ccc(C=CC2CCC(=O)CC2)cc1

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36
▸ CA5A P35218 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ CA5B Q9Y2D0 1/20 0.36
▸ TP53 P04637 1/20 0.36
▸ PTGS2 P35354 1/20 0.34
▸ MAOB P27338 13/20 0.33
▸ MAOA P21397 3/20 0.33
▸ PSMB8 P28062 1/20 0.33
▸ RAD51 Q06609 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28840266 0.78 CA1 (0.35) CA1CA2CA5ACA9CA5B
Cyclohexanone SCHEMBL28353416 0.75 CA1 (0.38) CA1CA2CA5ACA9CA5B
SCHEMBL27641560 0.74 TP53 (0.36) CA1CA2CA5ACA9CA5B
SCHEMBL23854165 0.74 CA1 (0.47) CA1CA2CA5ACA9CA5B
SCHEMBL13882617 0.74 CA1 (0.47) CA1CA2CA5ACA9CA5B
SCHEMBL15259665 0.72 SLC6A3 (0.31) CA1CA2CA5ACA9CA5B
SCHEMBL27440533 0.71 CYP2A6 (0.50) ALDH1A1LMNA
SCHEMBL13475881 0.70 CA1 (0.48) CA1CA2CA5ACA9CA5B
SCHEMBL9457904 0.70 MAOB (0.59) MAOBMAOAALDH1A1LMNA
SCHEMBL9457910 0.70 MAOB (0.59) MAOBMAOAALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1325505-A Photocurable and photopatternable hydrogel matrix based on azlactone copolymers MINNESOTA MINING & MFG (US) 2001-12-05 — — CN claimed
CN-103358749-B Original edition of lithographic printing plate 富士胶片株式会社 2018-01-30 — — CN disclosed
CN-107077070-A The manufacture method of photosensitive polymer combination, cured film, the element for possessing cured film and semiconductor devices 东丽株式会社 2017-08-18 — — CN disclosed
CN-103842185-B The printing process of the original edition of lithographic printing plate of developable on use machine 富士胶片株式会社 2016-11-23 — — CN disclosed
CN-105082725-A Lithographic printing original plate FUJIFILM CORP 2015-11-25 — — CN disclosed
CN-103596770-B Original edition of lithographic printing plate and method for platemaking thereof FUJIFILM CORP. (JP) 2015-10-07 — — CN disclosed
CN-102548769-B Lithographic printing plate precursor FUJIFILM CORP. (JP) 2015-08-12 — — CN disclosed
CN-104619512-A Original planographic printing plate, and plate making method FUJIFILM CORP 2015-05-13 — — CN disclosed
CN-102821969-B Master planographic printing plate and manufacturing method therefor FUJIFILM CORP 2014-12-03 — — CN disclosed
CN-102227316-B Lithographic printing plate precursor, lithographic printing plate making method and polymerizable monomer FUJI PHOTO FILM CO LTD 2014-04-02 — — CN disclosed
CN-102821968-A Planographic printing master plate and production method therefor FUJIFILM CORP 2012-12-12 — — CN disclosed
CN-1325505-A Photocurable and photopatternable hydrogel matrix based on azlactone copolymers MINNESOTA MINING & MFG (US) 2001-12-05 — — CN disclosed
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