Piperazine

Piperazine

SCHEMBL27552148

C1CNCCN1.c1cnccn1

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ESR1

The experimentally established mechanism targets of Piperazine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 1/20 0.50
MAPT P10636 1/20 0.50
PDE4A P27815 1/20 0.50
KDR P35968 1/20 0.50
ADRB2 P07550 1/20 0.42
NCF1 P14598 1/20 0.42
PLD1 Q13393 1/20 0.42
CXCR4 P61073 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CHRNB2 P17787 1/20 0.36
CHRNA4 P43681 1/20 0.36
KDM4E B2RXH2 2/20 0.33
GAA P10253 1/20 0.33
CYP2C9 P11712 1/20 0.33
ALDH1A1 P00352 2/20 0.31
CYP2D6 P10635 1/20 0.31
TSHR P16473 1/20 0.31
NAPRT Q6XQN6 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
NISCH Q9Y2I1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Piperazine SCHEMBL1128189 0.93 CXCR4 (0.53) HIF1AMAPTPDE4AKDRADRB2
Pyrazine SCHEMBL28417538 0.89 CXCR4 (0.60) HIF1AMAPTPDE4AKDRADRB2
Piperidine SCHEMBL1269716 0.87 ALDH1A1 (0.56) HIF1AMAPTPDE4AKDRADRB2
Pyrazine SCHEMBL27923542 0.85 HIF1A (0.33) HIF1AMAPTPDE4AKDRADRB2
Pyrazine SCHEMBL4071877 0.85 ALDH1A1 (0.53) HIF1AMAPTPDE4AKDRADRB2
Piperidine SCHEMBL2418231 0.82 ALDH1A1 (0.60) HIF1AMAPTPDE4AKDRADRB2
Piperazine SCHEMBL28156489 0.82 TSHR (0.60) HIF1AMAPTPDE4AKDRADRB2
Piperazine SCHEMBL1699696 0.82 TSHR (0.60) HIF1AMAPTPDE4AKDRADRB2
Piperazine SCHEMBL27917020 0.82 TSHR (0.60) HIF1AMAPTPDE4AKDRADRB2
Piperazine SCHEMBL27982866 0.82 TSHR (0.60) HIF1AMAPTPDE4AKDRADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110407970-A Preparation method, pure color material and the liquid crystal display device of dye stuff of rhodamine kinds monomeric oligomeric conjunction object SHENZHEN CHINA STAR OPTOELECT 2019-11-05 CN disclosed
CN-109980114-A Light-emitting component, display device, electronic equipment and lighting device 株式会社半导体能源研究所 2019-07-05 CN disclosed
CN-109841746-A Light-emitting component, display device, electronic equipment and lighting device 株式会社半导体能源研究所 2019-06-04 CN disclosed
CN-108697646-A Pharmaceutical compositions and methods for combating chemotherapy-induced cardiotoxicity 干细胞诊疗公司 2018-10-23 CN disclosed
CN-108349936-A It is used to treat N- [2- (1- benzyl piepridine -4- bases) ethyl] -4- (pyrazine -2- bases)-piperazine -1- carboxamides derivatives and related compound of neurological disorder as muscarinic receptor 4 (M4) antagonist 纽罗克里生物科学有限公司 2018-07-31 CN disclosed
CN-108350021-A Compound for treating ophthalmology disease and preparation 视点医疗公司 2018-07-31 CN disclosed
CN-108075044-A Light-Emitting Element, Display Device, Electronic Device, and Lighting Device 株式会社半导体能源研究所 2018-05-25 CN disclosed
CN-103433050-B Preparation method of catalyst for synthesizing piperazine through monoethanolamine catalytic amination one-step method ZHEJIANG LYUKEAN CHEMICAL CO LTD 2015-02-25 CN disclosed
CN-103433050-A Preparation method of catalyst for synthesizing piperazine through monoethanolamine catalytic amination one-step method ZHEJIANG LYUKEAN CHEMICAL CO LTD 2013-12-11 CN disclosed
CN-100429077-C Water-based ink, recorded image using the same, and method for forming image CANON KK (JP) 2008-10-29 CN disclosed
CN-1742061-A Water-based ink, recorded image using the same, and method for forming image CANON KK (JP) 2006-03-01 CN disclosed
CN-1332205-A Radiation-sensitive resin composition JSR CORP (JP) 2002-01-23 CN disclosed