Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | RECQL | P46063 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 3/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | CA4 | P22748 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | LCK | P06239 | 1/20 | 0.36 |
| ▸ | FYN | P06241 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | ING2 | Q9H160 | 1/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.35 |
| ▸ | GCK | P35557 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1217133 | 0.80 | ALDH1A1 (0.52) | ALDH1A1RECQLCA1CA2GAA | |
| SCHEMBL5378158 | 0.80 | ALDH1A1 (0.59) | ALDH1A1RECQLCA1GAACA12 | |
| SCHEMBL9359723 | 0.78 | ALDH1A1 (0.50) | ALDH1A1RECQLCA1CA2GAA | |
| SCHEMBL8381611 | 0.78 | ALDH1A1 (0.50) | ALDH1A1RECQLCA1CA2GAA | |
| SCHEMBL9359724 | 0.78 | ALDH1A1 (0.50) | ALDH1A1RECQLCA1CA2GAA | |
| SCHEMBL9292434 | 0.77 | CA1 (0.49) | ALDH1A1RECQLCA1CA2CA4 | |
| SCHEMBL14571064 | 0.76 | CA12 (0.46) | ALDH1A1RECQLCA1CA2CA4 | |
| SCHEMBL9292547 | 0.75 | CA1 (0.48) | ALDH1A1RECQLCA1CA2CA4 | |
| SCHEMBL9293398 | 0.75 | CA1 (0.48) | ALDH1A1RECQLCA1CA2CA4 | |
| SCHEMBL9293217 | 0.75 | CA1 (0.48) | ALDH1A1RECQLCA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8133654-B2 | Laser-decomposable resin composition and laser-decomposable pattern-forming material and flexographic printing plate precursor of laser engraving type using the same | FUJIFILM CORPORATION (JP) | 2012-03-13 | — | — | US | disclosed |
| US-20100075118-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100068470-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD OF PRODUCING THE SAME | FUJIFILM CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20090311494-A1 | RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND PROCESS FOR PRODUCING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090246653-A1 | RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND METHOD OF MANUFACTURING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-7531291-B2 | heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20090099320-A1 | LASER-DECOMPOSABLE RESIN COMPOSITION AND LASER-DECOMPOSABLE PATTERN-FORMING MATERIAL AND FLEXOGRAPHIC PRINTING PLATE PRECURSOR OF LASER ENGRAVING TYPE USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20080057437-A1 | heat-decomposable cured polyurethane having an aromatic group is directly connected to a urethane bond; high sensitivity to easily form a pattern | FUJIFILM CORPORATION (JP) | 2008-03-06 | — | — | US | disclosed |