SCHEMBL2758481

SCHEMBL2758481

CCC(C)c1ccc(OC(C)OCCOc2cccc3cc(OC)ccc23)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.46
NPSR1 Q6W5P4 1/20 0.40
ABCB11 O95342 1/20 0.39
ALDH1A1 P00352 2/20 0.37
MAPT P10636 2/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
KDM4E B2RXH2 1/20 0.37
POLB P06746 1/20 0.37
AKR1C3 P42330 4/20 0.36
AKR1C2 P52895 4/20 0.36
AKR1C1 Q04828 1/20 0.36
PTGS1 P23219 1/20 0.36
SLC6A2 P23975 2/20 0.36
SLC6A4 P31645 2/20 0.36
GAA P10253 2/20 0.36
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2758484 0.92 CYP2D6 (0.39) CYP2D6NPSR1ALDH1A1MAPTMEN1
SCHEMBL2758472 0.89 SLC6A2 (0.36) CYP2D6NPSR1ABCB11ALDH1A1MAPT
SCHEMBL2758474 0.88 HTR1B (0.46) KMT2ASLC6A4HTR1B
SCHEMBL2758471 0.85 ALDH1A1 (0.36) NPSR1ALDH1A1MAPTMEN1KMT2A
SCHEMBL2758485 0.85 ALDH1A1 (0.36) CYP2D6NPSR1ABCB11ALDH1A1MAPT
SCHEMBL683310 0.84 ABCB11 (0.46) NPSR1ABCB11ALDH1A1MAPTMEN1
SCHEMBL2758470 0.83 NPSR1 (0.49) NPSR1ALDH1A1MAPTMEN1KMT2A
SCHEMBL2758491 0.83 TP53 (0.35) ALDH1A1MAPTMEN1KMT2AGAA
SCHEMBL16382393 0.82 HTR1B (0.47) KMT2ASLC6A4HTR1B
SCHEMBL2758476 0.82 ABCB11 (0.44) ABCB11ALDH1A1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed