Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | MAPT | P10636 | 4/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.41 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.39 |
| ▸ | DAO | P14920 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11981074 | 0.84 | DAO (0.41) | ALDH1A1MAPTABCB11DAOSMN1; SMN2 | |
| SCHEMBL10138510 | 0.83 | ALDH1A1 (0.50) | ALDH1A1MAPTGAAABCB11HPGD | |
| SCHEMBL21135648 | 0.79 | ALDH1A1 (0.40) | ALDH1A1MAPTGAAABCB11HPGD | |
| SCHEMBL65276 | 0.77 | ALDH1A1 (0.58) | ALDH1A1MAPTDAOPTGS2TSHR | |
| SCHEMBL1621101 | 0.77 | DAO (0.53) | ALDH1A1MAPTDAOPTGS2GRIN2D | |
| SCHEMBL18893300 | 0.77 | ALDH1A1 (0.37) | ALDH1A1GAAHPGDTSHRUSP2 | |
| SCHEMBL19275144 | 0.75 | ALDH1A1 (0.40) | ALDH1A1MAPTGAAABCB11HPGD | |
| SCHEMBL28123040 | 0.75 | ALDH1A1 (0.55) | ALDH1A1MAPTDAOPTGS2TSHR | |
| SCHEMBL8228443 | 0.74 | DAO (0.47) | ALDH1A1MAPTDAOPTGS2TSHR | |
| SCHEMBL13317740 | 0.73 | ALDH1A1 (0.43) | ALDH1A1MAPTGAATSHRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9034560-B2 | Negative resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-8968988-B2 | Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask | FUJIFILM CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8906600-B2 | Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask | FUJIFILM CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| US-20140227642-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-8637222-B2 | Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern | FUJIFILM CORPORATION (JP) | 2014-01-28 | — | — | US | disclosed |
| US-20130052567-A1 | RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE RESIST COMPOSITION, NANOIMPRINT MOLD AND PHOTOMASK | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130052568-A1 | RESIST PATTERN FORMING METHOD, RESIST PATTERN, POSITIVE RESIST COMPOSITION, NANOIMPRINT MOLD AND PHOTOMASK | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20120003585-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110287234-A1 | NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2011-11-24 | — | — | US | disclosed |