SCHEMBL27587804

SCHEMBL27587804

NCc1ccc(OC(=O)CS)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F2 P00734 1/20 0.46
PRSS1 P07477 1/20 0.46
PRSS2 P07478 1/20 0.46
PRSS3 P35030 1/20 0.46
ST14 Q9Y5Y6 3/20 0.44
LOXL2 Q9Y4K0 1/20 0.43
KMT2A Q03164 4/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
MAPT P10636 1/20 0.41
HTT P42858 1/20 0.41
HSD17B10 Q99714 1/20 0.41
TPSAB1 Q15661 2/20 0.40
ABAT P80404 1/20 0.40
HDAC3 O15379 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
NCOR2 Q9Y618 1/20 0.40
HRH3 Q9Y5N1 1/20 0.38
MAOB P27338 3/20 0.38
ELANE P08246 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3360371 0.80 KMT2A (0.44) F2PRSS1PRSS2PRSS3KMT2A
SCHEMBL23818361 0.79 KMT2A (0.47) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL17449174 0.77 KMT2A (0.55) F2PRSS1PRSS2PRSS3ST14
Hydrochloric Acid SCHEMBL4433825 0.77 BCL9 (0.55) F2PRSS1PRSS2PRSS3LOXL2
SCHEMBL11097085 0.76 HDAC3 (0.60) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL28625377 0.76 KMT2A (0.51) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL8483877 0.76 KMT2A (0.47) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL3809052 0.76 LMNA (0.57) F2PRSS1PRSS2PRSS3ST14
SCHEMBL198474 0.76 LMNA (0.57) KMT2AALDH1A1LMNAMAPTHTT
SCHEMBL74367 0.75 CYP19A1 (0.52) PRSS1PRSS2PRSS3KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1550896-A Processes for preparing photoresist compositions and the product ��Ļ���Ű˾ 2004-12-01 CN disclosed