⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27597681 | 0.77 | FDPS (0.32) | — | |
| SCHEMBL7948575 | 0.75 | — | — | |
| SCHEMBL27892828 | 0.73 | FDPS (0.42) | — | |
| SCHEMBL6682309 | 0.72 | — | — | |
| Hydrogen Sulfide SCHEMBL28198805 | 0.72 | — | — | |
| SCHEMBL6944083 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL28200882 | 0.72 | — | — | |
| SCHEMBL28149382 | 0.70 | LMNA (0.39) | — | |
| SCHEMBL2438532 | 0.69 | — | — | |
| SCHEMBL19442749 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110049840-A | METHOD FOR PRODUCING NICKEL POWDER | 住友金属矿山株式会社 | 2019-07-23 | — | — | CN | claimed |
| CN-103616805-A | Cleaning fluid used in semiconductor manufacture process | QINGDAO HUAREN TECH INCUBATOR | 2014-03-05 | — | — | CN | claimed |
| CN-103616806-A | Cleaning fluid for photosensitive membrane | QINGDAO HUAREN TECH INCUBATOR | 2014-03-05 | — | — | CN | claimed |
| CN-103605268-A | Cleaning liquid used during semiconductor manufacturing process | QINGDAO HUAREN TECH INCUBATOR | 2014-02-26 | — | — | CN | claimed |
| CN-103605269-A | Novel photoresist removal liquid used for semiconductor making | QINGDAO HUAREN TECH INCUBATOR | 2014-02-26 | — | — | CN | claimed |
| CN-103529656-A | Imidazoline inhibitor containing photosensitive film cleaning solution | YANG GUIWANG | 2014-01-22 | — | — | CN | claimed |
| CN-1924710-B | Photoresist remover composition for removing modified photoresist of semiconductor device | DONGJIN SEMICHEM CO LTD | 2011-06-15 | — | — | CN | claimed |
| CN-100543590-C | The composition of polymer-stripping | ROHM & HAAS ELECT MAT (US) | 2009-09-23 | — | — | CN | claimed |
| CN-1924710-A | Optical resist clearing agent composition for wiping improved optical resist of semiconductor device | DONGJIN SEMICHEM CO LTD (KR) | 2007-03-07 | — | — | CN | claimed |
| CN-110049840-A | METHOD FOR PRODUCING NICKEL POWDER | 住友金属矿山株式会社 | 2019-07-23 | — | — | CN | disclosed |
| CN-103616805-A | Cleaning fluid used in semiconductor manufacture process | QINGDAO HUAREN TECH INCUBATOR | 2014-03-05 | — | — | CN | disclosed |
| CN-103616806-A | Cleaning fluid for photosensitive membrane | QINGDAO HUAREN TECH INCUBATOR | 2014-03-05 | — | — | CN | disclosed |
| CN-103605269-A | Novel photoresist removal liquid used for semiconductor making | QINGDAO HUAREN TECH INCUBATOR | 2014-02-26 | — | — | CN | disclosed |
| CN-103605268-A | Cleaning liquid used during semiconductor manufacturing process | QINGDAO HUAREN TECH INCUBATOR | 2014-02-26 | — | — | CN | disclosed |
| CN-101198309-A | Composition for protection of body surface | ASAHI CHEMICAL CORP (JP) | 2008-06-11 | — | — | CN | disclosed |
| CN-1940733-A | Stripper | ROHM & HAAS ELECT MAT (US) | 2007-04-04 | — | — | CN | disclosed |
| CN-1924710-A | Optical resist clearing agent composition for wiping improved optical resist of semiconductor device | DONGJIN SEMICHEM CO LTD (KR) | 2007-03-07 | — | — | CN | disclosed |
| CN-1916772-A | Stripper | ROHM & HAAS ELECT MAT (US) | 2007-02-21 | — | — | CN | disclosed |
| CN-1602221-A | Heat sealing filter materials | SCHOELLER & HOESCH PAPIERFAB (DE) | 2005-03-30 | — | — | CN | disclosed |
| CN-1533343-A | Heat-sealable filter material | ���(�¹�)ֽҵ����˾ | 2004-09-29 | — | — | CN | disclosed |