SCHEMBL27589737

SCHEMBL27589737

CCCCn1c(C)c(OC(=O)c2ccccc2C(=O)Oc2c(C)n(CCCC)c3ccccc23)c2ccccc21

nearest known ligand 0.58

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ CNR2 P34972 19/20 0.58
▸ CNR1 P21554 11/20 0.58
▸ SLC6A3 Q01959 1/20 0.54
▸ KDM4E B2RXH2 1/20 0.51
▸ LMNA P02545 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29031145 0.95 CNR2 (0.54) CNR2CNR1SLC6A3KDM4ELMNA
SCHEMBL18374177 0.90 CNR2 (0.51) CNR2CNR1SLC6A3KDM4ELMNA
SCHEMBL22958896 0.87 CNR2 (0.52) CNR2CNR1SLC6A3
SCHEMBL27589706 0.87 KDM4E (0.47) CNR2CNR1SLC6A3KDM4E
SCHEMBL29031119 0.82 KDM4E (0.46) CNR2CNR1KDM4E
SCHEMBL18255590 0.81 CNR2 (0.50) CNR2CNR1SLC6A3
SCHEMBL19678763 0.81 CNR2 (0.43) CNR2CNR1SLC6A3KDM4ELMNA
SCHEMBL22958846 0.77 KDM4E (0.41) CNR2CNR1KDM4ELMNA
SCHEMBL28174704 0.75 CNR2 (0.58) CNR2CNR1SLC6A3KDM4ELMNA
SCHEMBL11069801 0.74 CNR2 (0.76) CNR2CNR1SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116194845-A Photomask, exposure method, method for producing resin pattern, and method for producing photomask 富士胶片株式会社 2023-05-30 — — CN disclosed
CN-100526980-C Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO LTD (JP) 2009-08-12 — — CN disclosed
CN-1577087-A Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO LTD (JP) 2005-02-09 — — CN disclosed
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