Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 17/20 | 0.54 |
| ▸ | CNR1 | P21554 | 10/20 | 0.54 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.50 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.48 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.48 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.48 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.48 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.48 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27589737 | 0.95 | CNR2 (0.58) | CNR2CNR1SLC6A3KDM4ELMNA | |
| SCHEMBL29031119 | 0.88 | KDM4E (0.46) | CNR2CNR1KDM4EHSD17B10 | |
| SCHEMBL18374177 | 0.85 | CNR2 (0.51) | CNR2CNR1SLC6A3KDM4ELMNA | |
| SCHEMBL22958896 | 0.83 | CNR2 (0.52) | CNR2CNR1SLC6A3 | |
| SCHEMBL27589706 | 0.82 | KDM4E (0.47) | CNR2CNR1SLC6A3KDM4EHSD17B10 | |
| SCHEMBL11069801 | 0.81 | CNR2 (0.76) | CNR2CNR1SLC6A3 | |
| SCHEMBL11315147 | 0.77 | CNR2 (0.76) | CNR2CNR1SLC6A3 | |
| SCHEMBL18255590 | 0.77 | CNR2 (0.50) | CNR2CNR1SLC6A3 | |
| SCHEMBL19678763 | 0.77 | CNR2 (0.43) | CNR2CNR1SLC6A3KDM4ELMNA | |
| SCHEMBL7840464 | 0.76 | CNR2 (0.77) | CNR2CNR1SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116194845-A | Photomask, exposure method, method for producing resin pattern, and method for producing photomask | 富士胶片株式会社 | 2023-05-30 | — | — | CN | disclosed |