SCHEMBL27589706

SCHEMBL27589706

CCn1c(C)c(OC(=O)c2ccccc2C(=O)Oc2c(C)n(CC)c3ccccc23)c2ccccc21

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 6/20 0.47
▸ ALDH1A1 P00352 6/20 0.45
▸ TSHR P16473 3/20 0.44
▸ HPGD P15428 3/20 0.44
▸ HSD17B10 Q99714 2/20 0.44
▸ L3MBTL1 Q9Y468 2/20 0.44
▸ GAA P10253 1/20 0.44
▸ ALOX15 P16050 1/20 0.44
▸ ATM Q13315 1/20 0.44
▸ PTGER4 P35408 1/20 0.44
▸ MEN1 O00255 3/20 0.43
▸ KMT2A Q03164 3/20 0.43
▸ MAPT P10636 3/20 0.43
▸ CNR1 P21554 3/20 0.43
▸ CNR2 P34972 3/20 0.43
▸ MAPK1 P28482 2/20 0.43
▸ NR1I2 O75469 1/20 0.43
▸ CYP1A2 P05177 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43
▸ NR1H4 Q96RI1 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29031119 0.95 KDM4E (0.46) KDM4EALDH1A1TSHRHPGDHSD17B10
SCHEMBL22958846 0.89 KDM4E (0.41) KDM4EALDH1A1TSHRHPGDHSD17B10
SCHEMBL27589737 0.87 CNR2 (0.58) KDM4ECNR1CNR2SLC6A3
SCHEMBL29031145 0.82 CNR2 (0.54) KDM4EHSD17B10CNR1CNR2SLC6A3
SCHEMBL14959997 0.82 SCN1A (0.38) KDM4EALDH1A1TSHRHPGDHSD17B10
SCHEMBL18374177 0.77 CNR2 (0.51) KDM4ECNR1CNR2SLC6A3
SCHEMBL22958896 0.75 CNR2 (0.52) ALDH1A1CNR1CNR2HTTSLC6A3
SCHEMBL9883461 0.71 KDM4E (0.53) KDM4EALDH1A1TSHRHPGDHSD17B10
SCHEMBL9198796 0.71 ALDH1A1 (0.59) KDM4EALDH1A1TSHRHPGDMEN1
SCHEMBL9416196 0.71 ALDH1A1 (0.55) KDM4EALDH1A1TSHRHPGDALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116194845-A Photomask, exposure method, method for producing resin pattern, and method for producing photomask 富士胶片株式会社 2023-05-30 — — CN disclosed
CN-100526980-C Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO LTD (JP) 2009-08-12 — — CN disclosed
CN-1577087-A Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO LTD (JP) 2005-02-09 — — CN disclosed
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