⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10016687 | 1.00 | — | — | |
| SCHEMBL13157361 | 1.00 | — | — | |
| SCHEMBL3414661 | 0.71 | CHRM1 (0.32) | — | |
| SCHEMBL10144918 | 0.71 | CHRM1 (0.32) | — | |
| SCHEMBL13937259 | 0.71 | CHRM1 (0.32) | — | |
| SCHEMBL5526564 | 0.71 | CHRM1 (0.32) | — | |
| SCHEMBL13483877 | 0.71 | CHRM1 (0.32) | — | |
| SCHEMBL18721211 | 0.71 | CHRM1 (0.32) | — | |
| SCHEMBL10115217 | 0.70 | — | — | |
| SCHEMBL17285470 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234759-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | FUJIFILM CORPORATION (JP) | 2019-03-19 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20150338736-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-20150338736-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2015-11-26 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-9024058-B2 | Ammonium fluoroalkanesulfonates and a synthesis method therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130209937-A1 | Polymerizable Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition And Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20130209937-A1 | Polymerizable Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition And Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-15 | — | — | US | disclosed |
| WO-2013111667-A1 | FLUORINE-CONTAINING SULFONIC ACID SALT, FLUORINE-CONTAINING SULFONIC ACID SALT RESIN, RESIST COMPOSITION, AND PATTERN FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2013-08-01 | — | — | WO | disclosed |
| US-20120004447-A1 | Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110313190-A1 | Fluoroalkanesulfonic Acid Ammonium Salts and Method for Producing Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-22 | — | — | US | disclosed |
| US-20110313190-A1 | Fluoroalkanesulfonic Acid Ammonium Salts and Method for Producing Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-22 | — | — | US | disclosed |
| US-20110207954-A1 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110207954-A1 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110070544-A1 | Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method | Central Glass Company,Ltd. (JP) | 2011-03-24 | — | — | US | disclosed |
| US-20110034721-A1 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-02-10 | — | — | US | disclosed |