⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8847495 | 0.79 | CHRM1 (0.39) | — | |
| SCHEMBL368314 | 0.77 | SLC1A3 (0.37) | — | |
| SCHEMBL8847871 | 0.75 | CA2 (0.40) | — | |
| SCHEMBL8847477 | 0.75 | CHRM1 (0.41) | — | |
| SCHEMBL13711834 | 0.74 | — | — | |
| SCHEMBL112582 | 0.74 | — | — | |
| SCHEMBL12879790 | 0.74 | — | — | |
| SCHEMBL5801039 | 0.74 | — | — | |
| SCHEMBL277024 | 0.74 | — | — | |
| SCHEMBL276565 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9543147-B2 | Photoresist and method of manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-01-10 | — | — | US | disclosed |
| EP-2439204-B1 | HETEROCYCLIC COMPOUND AND HEMATOPOIETIC STEM CELL AMPLIFIER | NISSAN CHEMICAL IND LTD (JP) | 2017-01-04 | — | — | EP | disclosed |
| US-9527828-B2 | Method for expanding hematopoietic stem cells using heterocyclic compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9502231-B2 | Photoresist layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-11-22 | — | — | US | disclosed |
| EP-2218716-B1 | METHOD FOR AMPLIFYING HEMATOPOIETIC STEM CELLS USING HETEROCYCLIC COMPOUND | NISSAN CHEMICAL IND LTD (JP) | 2016-11-16 | — | — | EP | disclosed |
| US-9460909-B2 | Method for manufacturing semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-10-04 | — | — | US | disclosed |
| US-9436086-B2 | Anti-reflective layer and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2016-09-06 | — | — | US | disclosed |
| US-20160155632-A1 | Anti-Reflective Layer and Method | TAIWAN SEMICONDUCTOR MFG (TW) | 2016-06-02 | — | — | US | disclosed |
| US-20160155626-A1 | Method for Manufacturing Semiconductor Device | TAIWAN SEMICONDUCTOR MFG (TW) | 2016-06-02 | — | — | US | disclosed |
| US-9328085-B2 | Heterocyclic compounds and expansion agents for hematopoietic stem cells | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-05-03 | — | — | US | disclosed |
| US-5614519-A | (1-(2,3 or 4-N-morpholinoalkyl)-imidazol-4-yl)-benizimidazol-1-yl-methyl]-biphenyls useful as angiotensin-II antagonists | KARL THOMAE GMBH (DE) | 1997-03-25 | — | — | US | disclosed |
| US-5602127-A | ADMINISTERING TO TREAT HYPERTENSION | KARL THOMAE GMBH (DE) | 1997-02-11 | — | — | US | disclosed |
| EP-0757042-A1 | Ortho-substituted 2-methoxyiminophenylaceticacid methylester | BASF Aktiengesellschaft (DE) | 1997-02-05 | — | — | EP | disclosed |
| US-5594003-A | HYPOTENSIVE AGENTS | DR. KARL THOMAE GMBH (DE) | 1997-01-14 | — | — | US | disclosed |
| US-5591762-A | HYPOTENSIVE AGENTS | DR. KARL THOMAE GMBH (DE) | 1997-01-07 | — | — | US | disclosed |
| WO-1994019331-A1 | ORTHO-SUBSTITUTED 2-METHOXYIMINOPHENYLACETIC ACID METHYLAMIDES | BASF AKTIENGESELLSCHAFT (DE) | 1994-09-01 | — | — | WO | disclosed |
| EP-0414058-B1 | Carboxylic acid derivatives | BASF AG (DE) | 1994-06-15 | — | — | EP | disclosed |
| WO-1994011334-A1 | SUBSTITUTED ORTHO-ETHENYL-PHENYL ACETIC ACID DERIVATIVES | BASF AKTIENGESELLSCHAFT (DE) | 1994-05-26 | — | — | WO | disclosed |
| US-5085685-A | Herbicides | BASF AKTIENGESELLSCHAFT (DE) | 1992-02-04 | — | — | US | disclosed |
| EP-0414058-A2 | Carboxylic acid derivatives | BASF Aktiengesellschaft (DE) | 1991-02-27 | — | — | EP | disclosed |