Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | PRKDC | P78527 | 1/20 | 0.43 |
| ▸ | ABL1 | P00519 | 2/20 | 0.41 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.41 |
| ▸ | BCR | P11274 | 2/20 | 0.41 |
| ▸ | KIF11 | P52732 | 1/20 | 0.39 |
| ▸ | FABP4 | P15090 | 4/20 | 0.38 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.38 |
| ▸ | ADORA2A | P29274 | 2/20 | 0.37 |
| ▸ | ADORA1 | P30542 | 2/20 | 0.37 |
| ▸ | FABP5 | Q01469 | 2/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | PPARG | P37231 | 1/20 | 0.37 |
| ▸ | PPARD | Q03181 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12250910 | 0.85 | KIF11 (0.43) | KDM4EMEN1ALDH1A1HPGDKMT2A | |
| SCHEMBL30777597 | 0.85 | KIF11 (0.43) | KDM4EMEN1ALDH1A1HPGDKMT2A | |
| Hydrogen Sulfide SCHEMBL27589515 | 0.83 | PPARG (0.46) | ABL1ABCB1BCRKIF11GSTP1 | |
| SCHEMBL1263081 | 0.83 | KDM4E (0.42) | KDM4EMEN1ALDH1A1HPGDKMT2A | |
| SCHEMBL8858259 | 0.81 | PPARG (0.47) | ALDH1A1HPGDABL1ABCB1BCR | |
| SCHEMBL30749653 | 0.79 | PRKDC (0.41) | KDM4EMEN1ALDH1A1HPGDKMT2A | |
| SCHEMBL29209347 | 0.79 | PRKDC (0.41) | KDM4EMEN1ALDH1A1HPGDKMT2A | |
| Hydrogen Sulfide SCHEMBL28009127 | 0.77 | MEN1 (0.41) | KDM4EMEN1ALDH1A1KMT2ANPSR1 | |
| SCHEMBL3455245 | 0.77 | ABL1 (0.60) | KDM4EALDH1A1ABL1ABCB1BCR | |
| SCHEMBL244495 | 0.77 | KDM4E (0.40) | KDM4EMEN1ALDH1A1HPGDKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105283432-A | Composition comprising a compound containing a vinyl group | TOKYO OHKA KOGYO CO LTD | 2016-01-27 | — | — | CN | disclosed |
| CN-104909581-A | Pretreatment method of glass substrate used for forming etching mask | TOKYO OHKA KOGYO COMPANY | 2015-09-16 | — | — | CN | disclosed |
| CN-104649580-A | Chemical tempered glass substrate processing method | TOKYO OHKA KOGYO COMPANY | 2015-05-27 | — | — | CN | disclosed |
| CN-101970400-B | Novel salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method | CENTRAL GLASS CO LTD | 2015-04-22 | — | — | CN | disclosed |
| CN-101687740-B | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS CO LTD | 2014-07-02 | — | — | CN | disclosed |
| CN-103857721-A | Hybrid epoxy resins | DOW GLOBAL TECHNOLOGIES INC | 2014-06-11 | — | — | CN | disclosed |
| CN-103781813-A | Hybrid epoxy resin adducts | DOW GLOBAL TECHNOLOGIES INC | 2014-05-07 | — | — | CN | disclosed |
| CN-101687741-B | 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS CO LTD | 2014-02-19 | — | — | CN | disclosed |
| CN-103228694-A | Thermosettable compositions and thermosets prepared therefrom | DOW GLOBAL TECHNOLOGIES INC | 2013-07-31 | — | — | CN | disclosed |
| CN-102186890-B | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS CO LTD | 2013-07-31 | — | — | CN | disclosed |
| CN-103124757-A | Advanced epoxy resin compositions | DOW GLOBAL TECHNOLOGIES LLC | 2013-05-29 | — | — | CN | disclosed |
| CN-103124758-A | Advanced poly epoxy ester resin compositions | DOW GLOBAL TECHNOLOGIES LLC | 2013-05-29 | — | — | CN | disclosed |
| CN-102203057-A | Method for producing alkoxycarbonylfluoroalkanesulfonic acid salt | CENTRAL GLASS CO LTD | 2011-09-28 | — | — | CN | disclosed |
| CN-102186890-A | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS CO LTD | 2011-09-14 | — | — | CN | disclosed |
| CN-101970400-A | Novel salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method | CENTRAL GLASS CO LTD | 2011-02-09 | — | — | CN | disclosed |
| CN-101687741-A | 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS CO LTD | 2010-03-31 | — | — | CN | disclosed |
| CN-101687740-A | Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt | CENTRAL GLASS CO LTD | 2010-03-31 | — | — | CN | disclosed |
| CN-100564401-C | The method of anhydrous liquid phase production high purity hydroxyl polymer-containing | DUPONT ELECTRONIC TECHNOLOGIES (US) | 2009-12-02 | — | — | CN | disclosed |
| CN-101331155-A | Process for preparing stable photoresist compositions | DUPONT ELECTRONIC POLYMERS L P (US) | 2008-12-24 | — | — | CN | disclosed |
| CN-1578794-A | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity | DUPONT ELECTRONIC TECHNOLOGIES (US) | 2005-02-09 | — | — | CN | disclosed |