SCHEMBL276085

SCHEMBL276085

C=COCCOC(=O)c1cc(C(=O)OCCOC=C)cc(C(=O)OCCOC=C)c1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SERPINE1 P05121 4/20 0.52
TYR P14679 3/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
ESR1 P03372 6/20 0.40
TDP1 Q9NUW8 1/20 0.38
AKR1C4 P17516 1/20 0.38
AKR1C3 P42330 1/20 0.38
AKR1C2 P52895 1/20 0.38
AKR1C1 Q04828 1/20 0.38
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13045299 0.94 SERPINE1 (0.56) SERPINE1TYRL3MBTL1ESR1TDP1
SCHEMBL22110667 0.93 SERPINE1 (0.46) SERPINE1TYRL3MBTL1ESR1TDP1
SCHEMBL18055480 0.91 LMNA (0.50) SERPINE1ESR1TDP1AKR1C4AKR1C3
SCHEMBL4624467 0.89 SERPINE1 (0.47) SERPINE1TYRL3MBTL1TDP1
SCHEMBL276086 0.89 SERPINE1 (0.50) SERPINE1ESR1TDP1AKR1C4AKR1C3
SCHEMBL12938314 0.89 SERPINE1 (0.55) SERPINE1ESR1TDP1AKR1C4AKR1C3
SCHEMBL13219995 0.88 SERPINE1 (0.46) SERPINE1ESR1AKR1C4AKR1C3AKR1C2
SCHEMBL14505447 0.88 SERPINE1 (0.44) SERPINE1L3MBTL1ESR1TDP1AKR1C4
SCHEMBL6067577 0.88 ESR1 (0.47) SERPINE1ESR1TDP1CA12CA1
SCHEMBL16263505 0.88 CNR1 (0.44) SERPINE1L3MBTL1ESR1TDP1AKR1C4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240429448-A1 Silicon-Based Energy Storage Devices With Carboxylic Ether, Carboxylic Acid Based Salt, or Acrylate Electrolyte Containing Electrolyte Additives ENEVATE CORP (US) 2024-12-26 US claimed
US-20210218059-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2021-07-15 US claimed
US-20190190070-A1 SILICON-BASED ENERGY STORAGE DEVICES WITH CARBOXYLIC ETHER, CARBOXYLIC ACID BASED SALT, OR ACRYLATE ELECTROLYTE CONTAINING ELECTROLYTE ADDITIVES ENEVATE CORPORATION 2019-06-20 US claimed
US-20240429448-A1 Silicon-Based Energy Storage Devices With Carboxylic Ether, Carboxylic Acid Based Salt, or Acrylate Electrolyte Containing Electrolyte Additives ENEVATE CORP (US) 2024-12-26 US disclosed
US-12043770-B2 Temporary bonding composition, temporary bonding film, composite film, temporary bonding method and semiconductor wafer package DAXIN MATERIALS CORPORATION (TW) 2024-07-23 US disclosed
US-12043770-B2 Temporary bonding composition, temporary bonding film, composite film, temporary bonding method and semiconductor wafer package DAXIN MATERIALS CORPORATION (TW) 2024-07-23 US disclosed
US-20240219831-A1 PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-04 US disclosed
US-20240219831-A1 PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-04 US disclosed
US-12015122-B2 Silicon-based energy storage devices with carboxylic ether, carboxylic acid based salt, or acrylate electrolyte containing electrolyte additives ENEVATE CORPORATION (US) 2024-06-18 US disclosed
US-20230350295-A1 CROSSLINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-02 US disclosed
US-20230350302-A1 POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-02 US disclosed
US-20080044772-A1 ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS BREWER SCIENCE INC. 2008-02-21 US disclosed
US-20080044772-A1 ANTI-REFLECTIVE IMAGING LAYER FOR MULTIPLE PATTERNING PROCESS BREWER SCIENCE INC. 2008-02-21 US disclosed
US-20070207406-A1 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS ARMY, US OF AMER REPT BY SEC OF THE 2007-09-06 US disclosed
US-20070207406-A1 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS ARMY, US OF AMER REPT BY SEC OF THE 2007-09-06 US disclosed
US-20070117049-A1 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS US OF AMER REPT BY SEC OF THE ARMY 2007-05-24 US disclosed
US-20070117049-A1 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS US OF AMER REPT BY SEC OF THE ARMY 2007-05-24 US disclosed
EP-0464408-B1 Process for preparing star compounds SEKISUI CHEMICAL CO LTD (JP) 1994-01-12 EP disclosed
US-5102966-A Addition polymerization of unsaturated ethers using an unsaturated alkenyl polyether adduct as initiator and a cation-donating compound SEKISUI CHEMICAL CO., LTD. (JP) 1992-04-07 US disclosed
EP-0464408-A1 Process for preparing star compounds SEKISUI CHEMICAL CO., LTD. (JP) 1992-01-08 EP disclosed