SCHEMBL276086

SCHEMBL276086

C=COCCCCOC(=O)c1cc(C(=O)OCCCCOC=C)cc(C(=O)OCCCCOC=C)c1

nearest known ligand 0.50

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
SERPINE1 P05121 3/20 0.50
TDP1 Q9NUW8 1/20 0.48
ESR1 P03372 8/20 0.46
AKR1C4 P17516 1/20 0.46
AKR1C3 P42330 1/20 0.46
AKR1C2 P52895 1/20 0.46
AKR1C1 Q04828 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12938315 0.98 ESR1 (0.49) SERPINE1TDP1ESR1AKR1C4AKR1C3
SCHEMBL12938314 0.96 SERPINE1 (0.55) SERPINE1TDP1ESR1AKR1C4AKR1C3
SCHEMBL218011 0.90 TDP1 (0.56) SERPINE1TDP1
SCHEMBL20901416 0.89 ESR1 (0.46) SERPINE1TDP1ESR1AKR1C4AKR1C3
SCHEMBL13849510 0.89 ESR1 (0.42) SERPINE1TDP1ESR1AKR1C4AKR1C3
SCHEMBL1131138 0.89 TDP1 (0.58) TDP1ESR1
SCHEMBL276085 0.89 SERPINE1 (0.52) SERPINE1TDP1ESR1AKR1C4AKR1C3
SCHEMBL12879054 0.89 TDP1 (0.54) SERPINE1TDP1
SCHEMBL21338359 0.88 SERPINE1 (0.41) SERPINE1TDP1ESR1AKR1C4AKR1C3
SCHEMBL15865271 0.87 TDP1 (0.56) TDP1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220155688-A1 ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-11281104-B2 Alkaline developer soluable silicon-containing resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
EP-2766920-B1 SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING BREWER SCIENCE INC (US) 2020-12-02 EP disclosed
EP-2766920-B1 SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING BREWER SCIENCE INC (US) 2020-12-02 EP disclosed
US-20200225584-A1 ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2020-07-16 US disclosed
US-10331032-B2 Photosensitive, developer-soluble bottom anti-reflective coating material BREWER SCIENCE, INC. (US) 2019-06-25 US disclosed
US-RE46841-E1 Spin-on carbon compositions for lithographic processing BREWER SCIENCE, INC. (US) 2018-05-15 US disclosed
US-RE46841-E1 Spin-on carbon compositions for lithographic processing BREWER SCIENCE, INC. (US) 2018-05-15 US disclosed
US-RE46841-E1 Spin-on carbon compositions for lithographic processing BREWER SCIENCE, INC. (US) 2018-05-15 US disclosed
US-9960038-B2 Processes to pattern small features for advanced patterning needs BREWER SCIENCE, INC. (US) 2018-05-01 US disclosed
US-20090111057-A1 PHOTOIMAGEABLE BRANCHED POLYMER BREWER SCIENCE INC. 2009-04-30 US disclosed
US-20090111057-A1 PHOTOIMAGEABLE BRANCHED POLYMER BREWER SCIENCE INC. 2009-04-30 US disclosed
EP-1550513-B1 Wood substrate comprising an Ultraviolet radiation cured powder coatings ROHM & HAAS (US) 2008-08-06 EP disclosed
EP-1408095-B1 Free radical cured coating powders for low gloss powder coatings ROHM & HAAS (US) 2005-12-28 EP disclosed
EP-1550513-A1 Wood substrate comprising an Ultraviolet radiation cured powder coatings ROHM AND HAAS COMPANY (US) 2005-07-06 EP disclosed
US-6890997-B2 Powder coating of free radical curable epoxy resin and another free radical curable resin ROHM AND HAAS COMPANY (US) 2005-05-10 US disclosed
EP-1408095-A1 Free radical cured coating powders for low gloss powder coatings Rohm and Haas (US) 2004-04-14 EP disclosed
US-20040068027-A1 Free radical cured coating powders for smooth, low gloss powder coatings AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) 2004-04-08 US disclosed
US-20010056197-A1 Ormocers, method for their production, and their use DEGUSSA DENTAL GMBH & CO. KG (DE) 2001-12-27 US disclosed
US-20010051672-A1 Dental material based on cationically polymerizable monomers DEGUSSA DENTAL GMBH & CO. KG (DE) 2001-12-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20010056197-A1 Ormocers, method for their production, and their use ORMDL3, ORC3, OGG1 SERPINE1 4153/4885TDP1 687/4885ESR1 1231/4885
US-20010051672-A1 Dental material based on cationically polymerizable monomers SMCHD1, SMC2, SMC1A SERPINE1 3215/4885TDP1 1591/4885ESR1 3658/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.