SCHEMBL2762162

SCHEMBL2762162

CCCCCCCCO[CH]Cc1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 3/20 0.45
LTA4H P09960 1/20 0.43
ALDH1A1 P00352 2/20 0.42
DNM1 Q05193 2/20 0.42
MEN1 O00255 1/20 0.41
TP53 P04637 1/20 0.41
MAPK1 P28482 1/20 0.41
KMT2A Q03164 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
EPHX2 P34913 1/20 0.41
TSHR P16473 1/20 0.41
PKM P14618 1/20 0.41
LMNA P02545 1/20 0.41
CETP P11597 3/20 0.41
HTT P42858 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2761591 1.00 KCNH2 (0.45) KCNH2LTA4HALDH1A1DNM1MEN1
SCHEMBL2761482 0.98 LTA4H (0.44) KCNH2LTA4HALDH1A1DNM1MEN1
SCHEMBL9360571 0.93 LTA4H (0.44) KCNH2LTA4HALDH1A1TP53MAPK1
SCHEMBL2701986 0.85 MAOB (0.44) KCNH2LTA4HALDH1A1MEN1TP53
SCHEMBL6756009 0.83 KCNH2 (0.45) KCNH2LTA4HDNM1MEN1TP53
SCHEMBL6538484 0.81 KCNH2 (0.51) KCNH2CETP
SCHEMBL6539292 0.81 SIGMAR1 (0.46) KCNH2LTA4HALDH1A1CETP
SCHEMBL6538944 0.80 KCNH2 (0.54) KCNH2ALDH1A1TP53LMNA
SCHEMBL6538967 0.78 KCNH2 (0.51) KCNH2ALDH1A1
SCHEMBL2702507 0.77 MAOB (0.48) KCNH2LTA4HALDH1A1TP53TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2399168-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM Corporation (JP) 2011-12-28 EP disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed